- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/10 - Etching compositions
Patent holdings for IPC class C23F 1/10
Total number of patents in this class: 90
10-year publication summary
|
14
|
6
|
4
|
14
|
5
|
5
|
5
|
4
|
4
|
3
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Electronic Materials U.S.A., Inc. | 343 |
10 |
| Samsung Display Co., Ltd. | 38627 |
5 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
5 |
| Central Glass Company, Limited | 1293 |
4 |
| DONGWOO FINE-CHEM Co., Ltd. | 1429 |
3 |
| Queen's University at Kingston | 538 |
3 |
| Soulbrain Co., Ltd. | 286 |
3 |
| University Court of The University of ST Andrews | 303 |
3 |
| Drylyte, S.L. | 44 |
3 |
| FUJIFILM Corporation | 30514 |
2 |
| Panasonic Intellectual Property Management Co., Ltd. | 33997 |
2 |
| Element Six Abrasives S.A. | 145 |
2 |
| MacDermid Enthone Inc. | 249 |
2 |
| OCI Company Ltd. | 165 |
2 |
| Steros GPA Innovative, S.L. | 29 |
2 |
| Samsung Electronics Co., Ltd. | 157719 |
1 |
| General Electric Company | 13899 |
1 |
| Toshiba Corporation | 12560 |
1 |
| Applied Materials, Inc. | 20375 |
1 |
| Tokyo Electron Limited | 13807 |
1 |
| Other owners | 34 |