- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/16 - Acidic compositions
Patent holdings for IPC class C23F 1/16
Total number of patents in this class: 204
10-year publication summary
|
19
|
24
|
16
|
27
|
16
|
11
|
11
|
8
|
9
|
5
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Samsung Display Co., Ltd. | 38721 |
13 |
| FUJIFILM Electronic Materials U.S.A., Inc. | 346 |
8 |
| Samsung Electronics Co., Ltd. | 158156 |
7 |
| Mitsubishi Gas Chemical Company, Inc. | 3631 |
6 |
| Toppan Printing Co., Ltd. | 2083 |
6 |
| Kioxia Corporation | 10840 |
5 |
| FUJIFILM Corporation | 30543 |
4 |
| Applied Materials, Inc. | 20438 |
4 |
| Enf Technology Co., Ltd. | 59 |
4 |
| Soulbrain Co., Ltd. | 289 |
4 |
| Tokyo Electron Limited | 13843 |
3 |
| Kao Corporation | 5078 |
3 |
| Pacesetter, Inc. | 1538 |
3 |
| Mitsui Chemicals, Inc. | 3253 |
3 |
| Plastal Co., Ltd. | 7 |
3 |
| Rtx Corporation | 10110 |
3 |
| Apple Inc. | 58936 |
2 |
| Halliburton Energy Services, Inc. | 21305 |
2 |
| BASF SE | 21318 |
2 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48490 |
2 |
| Other owners | 117 |