- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/38 - Alkaline compositions for etching refractory metals
Patent holdings for IPC class C23F 1/38
Total number of patents in this class: 70
10-year publication summary
|
6
|
3
|
4
|
1
|
7
|
5
|
5
|
4
|
3
|
5
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30628 |
6 |
| Biomet 3i, LLC | 289 |
6 |
| Entegris, Inc. | 2016 |
4 |
| Selenium Medical | 96 |
4 |
| Tech Met, Inc. | 19 |
3 |
| E. I. du Pont de Nemours and Company | 3473 |
2 |
| Mitsubishi Electric Corporation | 48236 |
2 |
| Wako Pure Chemical Industries, Ltd. | 119 |
2 |
| EKC Technology, Inc. | 84 |
2 |
| MacDermid Enthone Inc. | 254 |
2 |
| Mitsubishi Gas Chemical Company, Inc. | 3634 |
2 |
| Sachem, Inc. | 66 |
2 |
| Technic France | 11 |
2 |
| Tokuyama Corporation | 1484 |
2 |
| Versum Materials US, LLC | 681 |
2 |
| Samsung Electronics Co., Ltd. | 158605 |
1 |
| Samsung Display Co., Ltd. | 38914 |
1 |
| Semiconductor Energy Laboratory Co., Ltd. | 11873 |
1 |
| Tokyo Electron Limited | 13884 |
1 |
| Showa Denko K.K. | 2061 |
1 |
| Other owners | 22 |