- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/44 - Compositions for etching metallic material from a metallic material substrate of different composition
Patent holdings for IPC class C23F 1/44
Total number of patents in this class: 181
10-year publication summary
|
18
|
7
|
11
|
9
|
24
|
10
|
16
|
9
|
6
|
7
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Samsung Display Co., Ltd. | 34696 |
8 |
| Adeia Semiconductor Solutions LLC | 290 |
7 |
| Atotech Deutschland GmbH | 556 |
6 |
| FUJIFILM Electronic Materials U.S.A., Inc. | 330 |
6 |
| DONGWOO FINE-CHEM Co., Ltd. | 1333 |
5 |
| Enf Technology Co., Ltd. | 51 |
5 |
| Mitsubishi Gas Chemical Company, Inc. | 3465 |
5 |
| Rtx Corporation | 9376 |
5 |
| Versum Materials US, LLC | 641 |
4 |
| Sumitomo Electric Industries, Ltd. | 15483 |
3 |
| FUJIFILM Corporation | 29367 |
3 |
| Texas Instruments Incorporated | 19470 |
3 |
| Tokyo Electron Limited | 12712 |
3 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8478 |
3 |
| Oerlikon Surface Solutions AG, Pfaffikon | 542 |
3 |
| Samsung Electronics Co., Ltd. | 146092 |
2 |
| General Electric Company | 13780 |
2 |
| Siemens AG | 24484 |
2 |
| Semiconductor Energy Laboratory Co., Ltd. | 11403 |
2 |
| Applied Materials, Inc. | 18621 |
2 |
| Other owners | 102 |