- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2276 - Measuring photoelectric effect , e.g. photoelectron emission microscopy [PEEM] using the Auger effect, e.g. Auger electron spectroscopy [AES]
Patent holdings for IPC class G01N 23/2276
Total number of patents in this class: 18
10-year publication summary
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0
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0
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1
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4
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1
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1
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0
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5
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2
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1
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| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Nippon Micrometal Corporation | 152 |
5 |
| JEOL Ltd. | 622 |
3 |
| ASML Netherlands B.V. | 7795 |
2 |
| Nippon Steel Chemical & Material Co., Ltd. | 709 |
2 |
| Mitsubishi Materials Corporation | 2463 |
1 |
| National University Corporation Nara Institute of Science and Technology | 225 |
1 |
| ThyssenKrupp AG | 3476 |
1 |
| ThyssenKrupp Industrial Solutions AG | 630 |
1 |
| Toray Research Center, Inc. | 4 |
1 |
| Sharp Display Technology Corporation | 1175 |
1 |
| Other owners | 0 |