- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/30 - Alternating PSM, e.g. Levenson-Shibuya PSMPreparation thereof
Patent holdings for IPC class G03F 1/30
Total number of patents in this class: 51
10-year publication summary
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4
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4
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4
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6
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3
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4
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4
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2
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2
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1
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| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48861 |
15 |
| Hoya Corporation | 2688 |
7 |
| Shin-Etsu Chemical Co., Ltd. | 6143 |
5 |
| Micron Technology, Inc. | 27793 |
3 |
| Seagate Technology LLC | 3967 |
3 |
| Dai Nippon Printing Co., Ltd. | 4270 |
3 |
| Samsung Electronics Co., Ltd. | 159029 |
2 |
| Samsung Display Co., Ltd. | 39087 |
2 |
| SK Hynix Inc. | 12667 |
2 |
| ASML Netherlands B.V. | 8019 |
2 |
| Boe Technology Group Co., Ltd. | 44653 |
1 |
| Beijing BOE Display Technology Co., Ltd. | 3022 |
1 |
| Newport Fab, LLC | 161 |
1 |
| Nissan Chemical Industries, Ltd. | 1630 |
1 |
| Shanghai Huali Microelectronics Corporation | 165 |
1 |
| Hitachi High-Tech Corporation | 5969 |
1 |
| Toppan Photomask Co., Ltd. | 33 |
1 |
| Other owners | 0 |