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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/50 - Mask blanks not covered by groups Preparation thereof

Patent holdings for IPC class G03F 1/50

Total number of patents in this class: 389

10-year publication summary

41
39
25
26
16
14
10
12
7
1
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Hoya Corporation
2757
78
Shin-Etsu Chemical Co., Ltd.
5878
35
Boe Technology Group Co., Ltd.
42523
21
Taiwan Semiconductor Manufacturing Company, Ltd.
46661
15
FUJIFILM Corporation
30063
12
Hon Hai Precision Industry Co., Ltd.
4005
10
Tsinghua University
6071
10
ASML Netherlands B.V.
7673
9
Samsung Display Co., Ltd.
37314
8
LG Chem, Ltd.
17745
8
Kioxia Corporation
10534
7
Intel Corporation
46583
6
Shenzhen China Star Optoelectronics Technology Co., Ltd.
8475
6
Beijing BOE Display Technology Co., Ltd.
2903
5
Beijing BOE Optoelectronics Technology Co., Ltd.
3916
5
Canon Inc.
41739
4
Nissan Chemical Industries, Ltd.
1683
4
Ordos Yuansheng Optoelectronics Co., Ltd.
1285
4
Samsung Electronics Co., Ltd.
151726
3
Industry-Academic Cooperation Foundation, Yonsei University
2423
3
Other owners 136

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