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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/54 - Absorbers, e.g. opaque materials

Patent holdings for IPC class G03F 1/54

Total number of patents in this class: 431

10-year publication summary

21
38
35
64
41
46
34
30
30
3
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Hoya Corporation
2757
84
Taiwan Semiconductor Manufacturing Company, Ltd.
46661
75
Applied Materials, Inc.
19717
37
Agc, Inc.
5162
32
Shin-Etsu Chemical Co., Ltd.
5878
30
Boe Technology Group Co., Ltd.
42523
14
Samsung Electronics Co., Ltd.
151726
13
Tekscend Photomask Corp.
33
10
Toppan Photomask Co., Ltd.
39
8
Shenzhen China Star Optoelectronics Technology Co., Ltd.
8475
6
Samsung Display Co., Ltd.
37314
5
LG Chem, Ltd.
17745
5
Beijing BOE Optoelectronics Technology Co., Ltd.
3916
5
Toppan Printing Co., Ltd.
2110
5
Hon Hai Precision Industry Co., Ltd.
4005
4
Tsinghua University
6071
4
HKC Corporation Limited
3391
4
KLA Corporation
1754
4
Hoya Electronics Singapore Pte. Ltd.
10
4
International Business Machines Corporation
61969
3
Other owners 79

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