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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/54 - Absorbers, e.g. opaque materials

Patent holdings for IPC class G03F 1/54

Total number of patents in this class: 443

10-year publication summary

21
38
35
64
41
46
35
30
30
15
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Hoya Corporation
2721
86
Taiwan Semiconductor Manufacturing Company, Ltd.
48302
78
Applied Materials, Inc.
20375
37
Agc, Inc.
5524
34
Shin-Etsu Chemical Co., Ltd.
6096
33
Samsung Electronics Co., Ltd.
157719
14
Boe Technology Group Co., Ltd.
44029
14
Tekscend Photomask Corp.
34
10
Toppan Photomask Co., Ltd.
34
8
Shenzhen China Star Optoelectronics Technology Co., Ltd.
8471
6
Samsung Display Co., Ltd.
38627
5
LG Chem, Ltd.
17921
5
Beijing BOE Optoelectronics Technology Co., Ltd.
3932
5
Toppan Printing Co., Ltd.
2087
5
Hon Hai Precision Industry Co., Ltd.
4022
4
Tsinghua University
6211
4
HKC Corporation Limited
3489
4
S&S Tech Co., Ltd.
33
4
KLA Corporation
1849
4
Hoya Electronics Singapore Pte. Ltd.
10
4
Other owners 79

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