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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/025 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds

Patent holdings for IPC class G03F 7/025

Total number of patents in this class: 65

10-year publication summary

4
4
5
10
5
3
4
3
3
4
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Datalase Ltd.
113
11
Shin-Etsu Chemical Co., Ltd.
5571
5
Lawrence Livermore National Security, LLC
1915
4
Taiwan Semiconductor Manufacturing Company, Ltd.
41799
3
JSR Corporation
2507
3
Ecole Polytechnique Federale de Lausanne (epfl) Epfl-tto
13
3
HRL Laboratories, LLC
1596
3
Tokyo Electron Limited
12420
2
FUJIFILM Electronic Materials U.S.A., Inc.
317
2
Nissan Chemical Corporation
1953
2
DuPont Electronic Materials International, LLC
412
2
3m Innovative Properties Company
17861
1
Sony Corporation
31215
1
International Business Machines Corporation
60753
1
Samsung SDI Co., Ltd.
7844
1
Massachusetts Institute of Technology
9967
1
Toray Industries, Inc.
6859
1
Carl Zeiss SMT GmbH
2920
1
3D Glass Solutions, Inc.
80
1
Changzhou Tronly Advanced Electronic Materials Co., Ltd.
77
1
Other owners 16

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