- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/025 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
Patent holdings for IPC class G03F 7/025
Total number of patents in this class: 65
10-year publication summary
4
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4
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5
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10
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5
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3
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4
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3
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3
|
4
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2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Datalase Ltd. | 113 |
11 |
Shin-Etsu Chemical Co., Ltd. | 5571 |
5 |
Lawrence Livermore National Security, LLC | 1915 |
4 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 41799 |
3 |
JSR Corporation | 2507 |
3 |
Ecole Polytechnique Federale de Lausanne (epfl) Epfl-tto | 13 |
3 |
HRL Laboratories, LLC | 1596 |
3 |
Tokyo Electron Limited | 12420 |
2 |
FUJIFILM Electronic Materials U.S.A., Inc. | 317 |
2 |
Nissan Chemical Corporation | 1953 |
2 |
DuPont Electronic Materials International, LLC | 412 |
2 |
3m Innovative Properties Company | 17861 |
1 |
Sony Corporation | 31215 |
1 |
International Business Machines Corporation | 60753 |
1 |
Samsung SDI Co., Ltd. | 7844 |
1 |
Massachusetts Institute of Technology | 9967 |
1 |
Toray Industries, Inc. | 6859 |
1 |
Carl Zeiss SMT GmbH | 2920 |
1 |
3D Glass Solutions, Inc. | 80 |
1 |
Changzhou Tronly Advanced Electronic Materials Co., Ltd. | 77 |
1 |
Other owners | 16 |