- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/09 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
Patent holdings for IPC class G03F 7/09
Total number of patents in this class: 1609
10-year publication summary
118
|
162
|
114
|
166
|
134
|
136
|
91
|
111
|
89
|
97
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 29702 |
154 |
Shin-Etsu Chemical Co., Ltd. | 5708 |
152 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 43854 |
130 |
Nissan Chemical Industries, Ltd. | 1704 |
88 |
Tokyo Electron Limited | 12994 |
56 |
JSR Corporation | 2532 |
51 |
DuPont Electronic Materials International, LLC | 429 |
45 |
Merck Patent GmbH | 5773 |
43 |
Samsung SDI Co., Ltd. | 8695 |
41 |
Samsung Electronics Co., Ltd. | 147983 |
31 |
International Business Machines Corporation | 61596 |
31 |
Nissan Chemical Corporation | 2077 |
30 |
Applied Materials, Inc. | 18968 |
21 |
Toray Industries, Inc. | 7002 |
21 |
Cheil Industries Inc. | 847 |
20 |
Resonac Corporation | 2917 |
20 |
Tokyo Ohka Kogyo Co., Ltd. | 1552 |
19 |
AZ Electronic Materials USA Corp. | 68 |
18 |
Eastman Kodak Company | 2834 |
16 |
Canon Inc. | 40555 |
14 |
Other owners | 608 |