- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/09 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
Patent holdings for IPC class G03F 7/09
Total number of patents in this class: 1697
10-year publication summary
|
162
|
115
|
168
|
134
|
138
|
91
|
111
|
89
|
116
|
61
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 6109 |
168 |
| FUJIFILM Corporation | 30516 |
152 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48438 |
136 |
| Nissan Chemical Industries, Ltd. | 1643 |
87 |
| Tokyo Electron Limited | 13824 |
58 |
| JSR Corporation | 2558 |
55 |
| Merck Patent GmbH | 5729 |
47 |
| DuPont Electronic Materials International, LLC | 427 |
47 |
| Samsung SDI Co., Ltd. | 10624 |
44 |
| Nissan Chemical Corporation | 2229 |
40 |
| Jicc-02 Co., Ltd. | 275 |
37 |
| Samsung Electronics Co., Ltd. | 157946 |
33 |
| International Business Machines Corporation | 62671 |
30 |
| Applied Materials, Inc. | 20406 |
28 |
| Resonac Corporation | 3546 |
22 |
| Toray Industries, Inc. | 7111 |
21 |
| Cheil Industries Inc. | 811 |
20 |
| AZ Electronic Materials USA Corp. | 65 |
18 |
| Tokyo Ohka Kogyo Co., Ltd. | 1563 |
18 |
| Brewer Science Inc. | 240 |
16 |
| Other owners | 620 |