- All sections
- H - Electricity
- H05H - Plasma technique production of accelerated electrically-charged particles or of neutronsproduction or acceleration of neutral molecular or atomic beams
- H05H 7/06 - Two-beam arrangementsMulti-beam arrangements
Patent holdings for IPC class H05H 7/06
Total number of patents in this class: 36
10-year publication summary
|
3
|
3
|
3
|
2
|
1
|
3
|
2
|
2
|
2
|
0
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7663 |
5 |
| Jefferson Science Associates, LLC | 104 |
3 |
| Tsinghua University | 6070 |
2 |
| Oxford University Innovation Limited | 1607 |
2 |
| Paul Scherrer Institut | 280 |
2 |
| Siemens AG | 24278 |
1 |
| Hitachi, Ltd. | 15800 |
1 |
| Varian Semiconductor Equipment Associates, Inc. | 1212 |
1 |
| Lawrence Livermore National Security, LLC | 1954 |
1 |
| Cornell University | 3382 |
1 |
| Elekta Limited | 223 |
1 |
| Gigaphoton Inc. | 1283 |
1 |
| INFICON, Inc. | 86 |
1 |
| ION Beam Applications S.A. | 190 |
1 |
| Muons, Inc. | 27 |
1 |
| Nuctech Company Limited | 1434 |
1 |
| The Science and Technology Facilities Council | 42 |
1 |
| Technische Universitat Darmstadt | 271 |
1 |
| University of Lancaster | 57 |
1 |
| Toshiba Energy Systems & Solutions Corp. | 1124 |
1 |
| Other owners | 7 |