- All sections
- H - Electricity
- H05H - Plasma technique production of accelerated electrically-charged particles or of neutronsproduction or acceleration of neutral molecular or atomic beams
- H05H 7/06 - Two-beam arrangementsMulti-beam arrangements
Patent holdings for IPC class H05H 7/06
Total number of patents in this class: 36
10-year publication summary
|
2
|
3
|
3
|
3
|
2
|
1
|
3
|
2
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2
|
1
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7434 |
5 |
| Jefferson Science Associates, LLC | 104 |
3 |
| Tsinghua University | 5951 |
2 |
| Oxford University Innovation Limited | 1550 |
2 |
| Paul Scherrer Institut | 284 |
2 |
| Siemens AG | 24409 |
1 |
| Hitachi, Ltd. | 15556 |
1 |
| Varian Semiconductor Equipment Associates, Inc. | 1231 |
1 |
| Lawrence Livermore National Security, LLC | 1947 |
1 |
| Cornell University | 3329 |
1 |
| Elekta Limited | 215 |
1 |
| Gigaphoton Inc. | 1242 |
1 |
| INFICON, Inc. | 82 |
1 |
| ION Beam Applications S.A. | 190 |
1 |
| Muons, Inc. | 26 |
1 |
| Nuctech Company Limited | 1423 |
1 |
| The Science and Technology Facilities Council | 45 |
1 |
| Technische Universitat Darmstadt | 266 |
1 |
| Toshiba Energy Systems & Solutions Corp. | 1086 |
1 |
| China Institute of Atomic Energy | 35 |
1 |
| Other owners | 7 |