| 2024 | Invention | Tungsten feature fill with nucleation inhibition. 
Described herein are methods of filling featur... | 
				    			
				    				
				    					| 2023 | Invention | Conformal deposition of silicon carbide films. Disclosed are methods and systems for providing si... | 
				    			
				    				
				    					|  | Invention | Plasma-enhanced deposition of film stacks. A method of depositing a film stack including films of... | 
				    			
				    				
				    					| 2022 | Invention | Lipseals and contact elements for semiconductor electroplating apparatuses. Disclosed are cup ass... | 
				    			
				    				
				    					|  | Invention | Tungsten feature fill with nucleation inhibition. Described herein are methods of filling feature... | 
				    			
				    				
				    					|  | Invention | Films of desired composition and film properties. Provided are methods and systems for providing ... | 
				    			
				    				
				    					| 2021 | Invention | Films of desired composition and film properties. 
Provided are methods and systems for providing... | 
				    			
				    				
				    					|  | Invention | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flo... | 
				    			
				    				
				    					|  | Invention | Tungsten feature fill. 
Described herein are methods of filling features with tungsten and relate... | 
				    			
				    				
				    					|  | Invention | Electroplating apparatus for tailored uniformity profile. An electroplating apparatus for electro... | 
				    			
				    				
				    					| 2019 | Invention | Cleaning electroplating substrate holders using reverse current deplating. Provided are cleaning ... | 
				    			
				    				
				    					|  | Invention | Method to obtain sic class of films of desired composition and film properties. 
Provided are met... | 
				    			
				    				
				    					|  | Invention | Systems and methods for determining film thickness using dc self-bias voltage. A controller for a... | 
				    			
				    				
				    					|  | Invention | Radical source design for remote plasma atomic layer deposition. A radical source for supplying r... | 
				    			
				    				
				    					|  | Invention | Ultrahigh selective polysilicon etch with high throughput. 
Provided are methods and apparatuses ... | 
				    			
				    				
				    					|  | Invention | Temperature controlled showerhead. A temperature controlled showerhead for chemical vapor deposit... | 
				    			
				    				
				    					| 2018 | Invention | Pecvd apparatus for in-situ deposition of film stacks. An apparatus for depositing film stacks in... | 
				    			
				    				
				    					|  | Invention | Low copper electroplating solutions for fill and defect control. 
Certain embodiments herein rela... | 
				    			
				    				
				    					|  | Invention | Tungsten feature fill. Described herein are methods of filling features with tungsten and related... | 
				    			
				    				
				    					|  | Invention | Protecting anodes from passivation in alloy plating systems. An apparatus for continuous simultan... | 
				    			
				    				
				    					|  | Invention | Method and apparatuses for reducing porogen accumulation from a uv-cure chamber. Porogen accumula... | 
				    			
				    				
				    					|  | Invention | Electroplating apparatus for tailored uniformity profile. Methods of electroplating metal on a su... | 
				    			
				    				
				    					|  | Invention | Methods for depositing films on sensitive substrates. Methods and apparatus to form films on sens... | 
				    			
				    				
				    					|  | Invention | Electroplating apparatus and process for wafer level packaging. An apparatus for continuous simul... | 
				    			
				    				
				    					|  | Invention | Soft landing nanolaminates for advanced patterning. Methods for depositing nanolaminate protectiv... | 
				    			
				    				
				    					| 2017 | Invention | Wetting pretreatment for enhanced damascene metal filling. Disclosed are pre-wetting apparatus de... | 
				    			
				    				
				    					|  | Invention | Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating. Metho... | 
				    			
				    				
				    					|  | Invention | Dynamic current distribution control apparatus and method for wafer electroplating. Methods, syst... | 
				    			
				    				
				    					|  | Invention | Configuration and method of operation of an electrodeposition system for improved process stabili... | 
				    			
				    				
				    					|  | Invention | Method and apparatus for electroplating semiconductor wafer when controlling cations in electroly... | 
				    			
				    				
				    					|  | Invention | Methods and apparatus for wetting pretreatment for through resist metal plating. Disclosed are pr... | 
				    			
				    				
				    					|  | Invention | Wafer chuck with aerodynamic design for turbulence reduction. A rotatable wafer chuck includes ch... | 
				    			
				    				
				    					|  | Invention | Cross flow manifold for electroplating apparatus. The embodiments herein relate to methods and ap... | 
				    			
				    				
				    					|  | Invention | Plasma activated conformal dielectric film deposition. Methods of depositing a film on a substrat... | 
				    			
				    				
				    					| 2009 | G/S | Technical consultancy in relation to the production of semiconductors; designing of semiconductor... | 
				    			
				    				
				    					| 2008 | G/S | Machines for manufacturing semiconductors, and parts for such machines. Computer software for int... | 
				    			
				    				
				    					|  | G/S | Machines for removing light-sensitive organic polymers from semiconductor chips during the manufa... | 
				    			
				    				
				    					| 2004 | Invention | Tensile dielectric films using uv curing. 2. Other dielectric capping layer film materials show s... | 
				    			
				    				
				    					| 2000 | G/S | Machines for manufacturing semiconductors and parts for such machines in class 7. | 
				    			
				    				
				    					| 1998 | G/S | MACHINES FOR MANUFACTURING SEMICONDUCTORS AND PARTS FOR SUCH MACHINES |