MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. (Allemagne)
Inventeur(s)
Uebel, Patrick Sebastian
Frosz, Michael Henoch
Lagler, Josef
Abrégé
A method of manufacturing an optical fiber and a fiber manufacturing intermediate product. The fiber manufacturing intermediate product includes: an outer jacket; and a plurality of capillaries, wherein the capillaries include an intermediate level capillary diameter ratio of capillary inner diameter to outer capillary diameter greater than 0.90 and wherein a nominal wall thickness of each of the capillaries at the intermediate-level is greater than 1500 nm. This intermediate product may be drawn to a fiber where the wall thickness in each of the capillaries in the drawn fiber is less than 200 nm.
A charged particle-optical element for a charged particle-optical module configured to direct charged particles along at least one beam path, the charged particle-optical element comprising: a substrate comprising at least one aperture for passage therethrough of the at least one beam path; at least one electronic component so as to provide a component surface of the substrate; and an electrical connector electrically connected to the at least one electronic component and extending through the substrate; wherein the substrate comprises a thicker portion and a thinner portion that is thinner than the thicker portion, and the electrical connector extends through the thinner portion.
A method for determining at least one height of a surface of an object comprises projecting a patterned radiation beam onto an object so as to form an image of a pattern. The image of the pattern comprises first and second portions, each of the first and second portions comprising at least one line, wherein at least one line of the first portion is disposed at a non-zero angle to at least one line of the second portion. The method further comprises receiving a portion of the patterned radiation beam reflected from the substrate. The method further comprises determining at least one height from a combination of: (a) a part of the received portion of the patterned radiation beam reflected from the first portion of the pattern; and (b) a part of the received portion of the patterned radiation beam reflected from the second portion of the pattern.
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
4.
A METHOD, DEVICE, CHARGED PARTICLE-OPTICAL APPARATUS AND AN ASSESSMENT APPARATUS
The present invention provides a method of determining data representative of a focal surface of an array of charged particle beams and/or a height of a sample surface in a multi-beam charged particle-optical device, the method comprising: projecting beams onto a sample location at a first relative position; determining first individual focus values for individual beams; displacing the sample relative to the array of beams along a distance to a second relative position; determining second individual focus values for individual beams; displacing the sample relative to the array of beams along a distance to a third relative position; determining third individual focus values for individual beams in the array; and determining the data representative of the focal surface of the array of beams and/or the height of the sample surface based on the first individual focus values, the second individual focus values and the third individual focus values.
The present invention provides an optical component for a charged particle-optical device. The device is configured to project one or more charged particle beams towards a sample. The optical component is configured to receive optical radiation from an external waveguide and to direct the optical radiation towards a sample. The optical component comprises a photonic element and a coupling element. The photonic element is configured to project optical radiation towards the sample. The coupling element is configured to optically couple an external waveguide to the photonic element, the coupling element comprising two facets that are mutually angled and an optical path between the two facets.
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
A fluid handling structure configured to confine immersion liquid to an immersion space and comprising: a liquid supply opening to supply immersion liquid to the immersion space; a extraction opening outwards of the liquid supply opening to extract fluid from the immersion space; a gas supply opening outwards of the fluid extraction opening to supply a soluble gas to the vicinity of the immersion space; and a gas extraction opening outwards of the gas supply opening to extract gas from the vicinity of the immersion space; wherein the bottom surface has: an outer portion outward of the gas extraction opening, the outer portion facing the substrate in use and separated from the substrate by a first distance; and a barrier projecting toward the substrate by a second distance, the second distance being in the range of from 40% to 99% of the first distance.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A seal assembly which has a housing that defines a channel. A conduit first end, of a conduit which has a central axis, extends into the channel. The conduit first end defines a tip portion of the conduit. The seal assembly further has a radial protrusion that is disposed adjacent the tip portion of the conduit first end. The seal assembly further has a seal element, which extends about the tip portion of the conduit first end. The seal element is fully enclosed by the housing, the tip portion of the conduit, and the radial protrusion. The seal assembly further has a biasing assembly, which is configured to exert an axial compressive load on the seal element via the radial protrusion and the housing. The seal element is configured to urge against the housing, the tip portion of the conduit, and the radial protrusion by the axial compressive load.
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
8.
SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTURE OF CHARGING DYNAMICS
Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/244 - DétecteursComposants ou circuits associés
An actuator (26) comprising a first magnetic assembly attached to a long stroke module (22) and comprising at least two first permanent magnets (36), a second magnetic assembly attached to a short stroke module and comprising at least one second permanent magnet (38). The first and second magnetic assemblies are configured to support the short stroke module with respect to the long stroke module (22) in a first direction (z). The second magnetic assembly is located between the first permanent magnets (36). The actuator includes an electrically conductive element (40) connectable to a power supply. The first magnetic assembly is longer than the second magnetic assembly in a second direction (x) to enable relative displacement of the short stroke module and the long stroke module (22) and the first magnetic assembly is geometrically configured such that a substantially homogeneous parallel magnetic field is provided.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
H02K 41/03 - Moteurs synchronesMoteurs pas à pasMoteurs à réluctance
Disclosed is a constrained layer damper component, comprising: a base layer having a lower surface and an upper surface; a constraining layer; a viscoelastic layer positioned between the base layer and the constraining layer; and a weakening feature arranged to provide a localized portion of the constrained layer damper component having a reduced bending stiffness compared to remaining portions of the constrained layer damper component.
F16F 9/30 - Ressorts, amortisseurs de vibrations, amortisseurs de chocs ou amortisseurs de mouvement de structure similaire, utilisant un fluide ou moyen équivalent comme agent d'amortissement avec un matériau solide ou semi-solide, p. ex. des masses pâteuses, comme agent d'amortissement
A radiation coupling system comprising a cladding provided within a substrate, wherein an array of strips is provided within the cladding, wherein the strips extend into the cladding from a face of the cladding, wherein the strips have a refractive index which is greater than the refractive index of the cladding, and wherein the strips are configured to together provide an optically coupled structure which acts as a waveguide; wherein the radiation coupling system further comprises a plurality of waveguides which are coupled to the array of strips.
G02B 6/12 - Guides de lumièreDétails de structure de dispositions comprenant des guides de lumière et d'autres éléments optiques, p. ex. des moyens de couplage du type guide d'ondes optiques du genre à circuit intégré
G02B 6/30 - Moyens de couplage optique pour usage entre fibre et dispositif à couche mince
G02B 6/122 - Éléments optiques de base, p. ex. voies de guidage de la lumière
12.
METHODS OF ESTIMATING A PERFORMANCE PARAMETER DISTRIBUTION AND ASSOCIATED APPARATUSES
Disclosed is a method of estimating values of a performance parameter on a substrate: providing a plurality of first differences between measured values of the performance parameter obtained after having measured the performance parameter at multiple different locations across at least a first portion of the substrate and estimated values of the performance parameter obtained at the same respective locations using a first fitted fingerprint model for estimating a first spatial distribution of the performance parameter over the at least a first portion of the substrate; defining one or more zones within the at least a first portion of the substrate, wherein each zone comprises a first exposure field and at least part of one or more second exposure fields; and estimating the values of the performance parameter over the first exposure field of each of the one or more zones from said plurality of first differences.
Assembly for determining a characteristic of a structure on a substrate, comprising a radiation illumination dipole having first and second sources that are angularly offset to a transverse direction in an illumination pupil plane. The first and second sources irradiate a structure having a periodically repeating pattern along a transverse. A multi-part wedge is located in an exit pupil of the assembly, configured to receive from the structure: a lower radiation order and a higher radiation order of diffracted radiation of the first source on a first part of the multi-part wedge, and a lower radiation order and a higher radiation order of diffracted radiation of the second source on a second part of the multi-part wedge. A detector receives a first and second spatially separated images formed from first and second source radiation incident on the first and second parts of the wedge, respectively.
The present disclosure provides a sensor system, comprising: a first sensor for determining a position of an aerial image as formed by a projection system, the first sensor comprising at least one first grating (66), and a detector (64) configured to record first radiation (82) transmitted through the first grating (66); and a second sensor (AS) for detecting second radiation (94) as reflected from the at least one first grating (66).
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
15.
POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
In an integrated displacement sensor, a light source beam is guided along a plane, and at least part of said beam is received at an emission grating and diffracted away from the plane to form an emission beam. A target grating arranged on an object of interest receives the emission beam, which is diffracted thereupon to form zero order, first order and minus first order diffraction beams. Two first order couplers form planar first and minus first order diffraction beams. A zero order coupler forms a planar zero order diffraction beam; a first and minus first order combining device generates at least one first diffraction order interference optical signal; a zero order combining device generates a zero diffraction order interference optical signal using the planar zero order diffraction beam and a reference part of the light source beam; optical sensors receive diffraction order interference optical signals and generate output signals.
G01B 11/00 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A computer implemented method for modeling metrology data comprising obtaining first measurement data sampled on a first measurement layout, fitting a first model to the first measurement data as sampled on the first measurement layout to obtain a first fitted first model, fitting the first model to the first measurement data as sampled on a second measurement layout to obtain a second fitted first model, determining a difference model as a residual model or the difference of the first fitted first model and the second fitted first model; and correcting a fitted second model using the difference model.
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
17.
METHOD OF DETERMINING DEGRADATION ON A SENSOR FIDUCIAL
Disclosed is a method of determining at least one performance indicator, each said performance indicator quantifying degradation of at least one component of an integrated circuit manufacturing apparatus and/or an effect of degradation of said at least one component on performance of said manufacturing apparatus. The method comprises obtaining at least reticle alignment data relating to a reticle alignment action, determining at least one variation metric relating to a variation of at least one reticle alignment error model parameter of a reticle alignment model fitted to said reticle alignment data and determining the at least one performance indicator from said at least one variation metric.
A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
A charged particle-optical element configured to operate on a plurality of charged particle beams in a beam grid, the charged particle-optical element comprises: a first surface and a second surface, wherein each of the first surface and the second surface: has a plurality of apertures defined in it for allowing the beams to pass through, is angled relative to a plane perpendicular to an axis of the beam grid; and faces another surface of the charged particle-optical element at a potential difference, such that the charged particle-optical element is configured to apply a deflection to the beams by controlling the potential difference.
11) in the first direction and have a unit cell in the first direction comprising a set of at least two gratings. The first and second portions are generally mutually interleaved such that at least in a central portion of the metrology target, each set of at least two gratings of one of the first and second portions is positioned between two adjacent sets of at least two gratings of the other one of the first and second portions. The first and second portions have a different pattern in a second direction that is generally perpendicular to the first direction.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 1/44 - Aspects liés au test ou à la mesure, p. ex. motifs de grille, contrôleurs de focus, échelles en dents de scie ou échelles à encoches
21.
PROJECTION-BASED DIE-TO-DATABASE ALIGNMENT FOR IMAGE-BASED INSPECTION
A non-transitory computer-readable medium stores a set of instructions that is executable by at least one processor of an apparatus to cause the apparatus to perform operations. The operations include extracting boundaries of a formed pattern disposed on a substrate from image information and boundaries of a design pattern from design information. The design information includes a design pattern. The image information is a two-dimensional representation of the formed pattern acquired by an image acquisition system. The operations also include generating one-dimensional projections of the boundaries of the formed pattern and the design pattern. The operations also include cross-correlating the one-dimensional projections of the formed pattern and the design pattern to generate an alignment result.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
An optical system including a double quad mirror. The optical system is configured to reflect two quadrants of an incident radiation beam approaching from either side of the mirror, while allowing the opposite two quadrants to transmit incident radiation. The optical system has a body with at least one transmissive surface and at least one reflective surface for radiation incident on different sides of the body. The at least one reflective surface on the body is adjacent to a recess within the body that creates an air gap for total internal reflection of radiation incident on the reflective surface toward a first target or toward a sensor. The at least one transmissive surface on the body is configured to transmit incident radiation through the body toward a second target or toward the sensor.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
23.
MULTISCALE PHYSICAL ETCH MODELING AND METHODS THEREOF
Systems and methods for simulating a plasma etch process are disclosed. According to certain embodiments, a method for simulating a plasma etch process may include predicting a first characteristic of a particle of a plasma in a first scale based on a first plurality of parameters; predicting a second characteristic of the particle in a second scale based on a modification of the first characteristic caused by a second plurality of parameters; and simulating an etch characteristic of a feature based on the first and the second characteristics of the particle. A multi-scale physical etch model or a multi-scale data driven model may be used to simulate the plasma etch process.
G06F 30/398 - Vérification ou optimisation de la conception, p. ex. par vérification des règles de conception [DRC], vérification de correspondance entre géométrie et schéma [LVS] ou par les méthodes à éléments finis [MEF]
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
24.
METHOD FOR IMPROVING CONSISTENCY IN MASK PATTERN GENERATION
A method of determining a mask pattern for a target pattern to be printed on a substrate. The method includes partitioning a portion of a design layout including the target pattern into a plurality of cells with reference to a given location on the target pattern; assigning a plurality of variables within a particular cell of the plurality of cells, the particular cell including the target pattern or a portion thereof; and determining, based on values of the plurality of variables, the mask pattern for the target pattern such that a performance metric of a patterning process utilizing the mask pattern is within a desired performance range.
G06F 30/398 - Vérification ou optimisation de la conception, p. ex. par vérification des règles de conception [DRC], vérification de correspondance entre géométrie et schéma [LVS] ou par les méthodes à éléments finis [MEF]
G03F 1/36 - Masques à correction d'effets de proximitéLeur préparation, p. ex. procédés de conception à correction d'effets de proximité [OPC optical proximity correction]
G03F 1/70 - Adaptation du tracé ou de la conception de base du masque aux exigences du procédé lithographique, p. ex. correction par deuxième itération d'un motif de masque pour l'imagerie
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Disclosed is a method of deforming a first patterned substrate or one or more first substrate portions thereof, configured to be bonded to a second patterned substrate, the method comprising providing at least said first patterned substrate or one or more first substrate portions thereof with a layer comprising a material that changes its phase when exposed to a radiation; and irradiating the layer with the radiation, wherein the radiation imposes a stress within the first patterned substrate or one or more first substrate portions thereof, the stress causing deformation of the first patterned substrate or one or more first substrate portions thereof that at least partially corrects a position error of a pattern of the first patterned substrate or one or more first substrate portions thereof.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
H01L 21/18 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives les dispositifs ayant des barrières de potentiel, p. ex. une jonction PN, une région d'appauvrissement ou une région de concentration de porteurs de charges les dispositifs ayant des corps semi-conducteurs comprenant des éléments du groupe IV du tableau périodique, ou des composés AIIIBV, avec ou sans impuretés, p. ex. des matériaux de dopage
A substrate support configured to support a substrate. The substrate support, comprises a main body. The main body has a first side configured to support the substrate, and a second side opposite to the first side. A plurality of grooves is formed in the main body. The plurality of grooves comprises a first groove and a second groove longer than the first groove. The first groove is configured to impede a flow of fluid through the first groove in a first direction and to allow the flow of fluid through the first groove in a second direction, opposing the first direction.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A method for controlling a position of a movable object, the method including: measuring a position of a sensor or sensor target on the movable object to obtain a position measurement signal, providing an error signal, providing a control signal on the basis of the error signal using a controller, providing a feed-forward signal on the basis of a set-point signal, actuating one or more actuators on the basis of the control signal and the feed-forward signal, and providing a compliance compensation signal, wherein the error signal is obtained by comparing a set-point position, the measured position of the position measurement, and the compliance compensation signal, and wherein the compliance compensation signal is a direction dependent compliance compensation signal, which direction dependent compliance compensation signal is dependent on a direction of acceleration of the movable object.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G05B 19/19 - Commande numérique [CN], c.-à-d. machines fonctionnant automatiquement, en particulier machines-outils, p. ex. dans un milieu de fabrication industriel, afin d'effectuer un positionnement, un mouvement ou des actions coordonnées au moyen de données d'un programme sous forme numérique caractérisée par systèmes de commande de positionnement ou de commande de contournage, p. ex. pour commander la position à partir d'un point programmé vers un autre point ou pour commander un mouvement le long d'un parcours continu programmé
A handler is configured to move a patterning device. The handler comprises a retractable rail. The handler further comprises an actuator configured to actuate the patterning device upwards along the retractable rail. The actuator is further configured to actuate the patterning device from a manual loading height to a load port height along the retractable rail. The retractable rail is upwardly retractable.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
29.
A SYSTEM AND METHOD FOR DETERMINING A NOISE CHARACTERISTIC FROM IMAGES OF AN INSPECTION APPARATUS
A non-transitory computer-readable medium stores a set of instructions that is executable by at least one processor of an apparatus to perform operations for determining a noise characteristic from images acquired using an inspection apparatus. The operations include analyzing the images. The images represent a same region of a substrate having a device pattern. The images include lines of pixels. The images are associated with different line sampling frequencies of the inspection apparatus. The analyzing includes extracting position information of edges of the device pattern from grayscale values of each pixel line of the images. The analyzing also includes transforming the position information into frequency domain information having aliased noise information. The analyzing also includes determining a noise frequency higher than Nyquist frequencies based on the aliased noise information.
A method, a non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computing device, and an apparatus including a memory storing a set of instructions and at least one processor configured to execute the set of instructions to cause the apparatus to perform operations are disclosed. The method and instructions are for minimizing a beam displacement from a center position in a charged particle beam (CPB) tool and includes obtaining a beam spot displacement on a wafer plane in relation to a first CPB component; altering the first CPB component in a manner that shifts the beam spot; comparing beam spot displacement based on the altering; and calculating, based on the comparison, first CPB component characteristics for minimizing beam displacement from the center position.
A method is disclosed for use in an exposure apparatus comprising: at least one substrate support configured to support a substrate; a patterning device support configured to support a patterning device; and imaging optics arranged to form an image of a patterning device supported by the patterning device support on a substrate supported by the at least one substrate support when disposed in an exposure region. The method comprises making one or more measurements that are indicative of a shape of a patterning device supported by the patterning device support. There is at least some temporal overlap between making the one or more measurements and moving a substrate support of the at least one substrate support away from the exposure region and/or moving a substrate support of the at least one substrate support towards the exposure region.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
32.
RADIATION SOURCE, EUV UTILIZATION APPARATUS, AND METHOD
There is provided a radiation source comprising a laser system, wherein the laser system is arranged to transport a laser beam from a source to a target region along a beam path, the beam path including at least one optical element in thermal communication with a vapour chamber arranged to distribute thermal energy provided by the laser beam and to cool the optical element in combination with a heat sink. Also provided is an EUV utilization apparatus including the radiation as well as a method of operating the radiation. Also described is the use of such a radiation source, EUV utilization apparatus or method in an EUV utilization method or apparatus.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
F28D 15/02 - Appareils échangeurs de chaleur dans lesquels l'agent intermédiaire de transfert de chaleur en tubes fermés passe dans ou à travers les parois des canalisations dans lesquels l'agent se condense et s'évapore, p. ex. tubes caloporteurs
G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
The present disclosure relates to methods and apparatus for joining a first semiconductor substrate and a second semiconductor substrate. The method may comprise: first pushing the first semiconductor substrate towards an auxiliary member to bring the first semiconductor substrate into contact with the auxiliary member; and then second pushing the second semiconductor substrate towards the first semiconductor substrate and the auxiliary member to cause joining of the first semiconductor substrate and the second semiconductor substrate, wherein the first pushing is substantially the same as the second pushing. Additionally or alternatively, the method may comprise: clamping an auxiliary member to a clamp, wherein the first semiconductor substrate is secured to the auxiliary member; and pushing the auxiliary member away from the clamp and towards the second semiconductor substrate to bring the first semiconductor substrate into contact with the second semiconductor substrate.
Embodiments herein describe methods, devices, and systems for an object stage system. The disclosure provides an object stage system, comprising: a body having a top surface, a bottom surface, and side surfaces; a clamp connected to the top surface of the body for clamping the object; and at least one actuator arranged in or on the body for changing a flatness of the clamp or the object.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Disclosed is a bonding apparatus for bonding a first substrate to a second substrate, the bonding apparatus comprising: a first support configured to support the first substrate; a second support configured to support the second substrate, wherein at least one of the first support and the second support comprises a surface to be conditioned, the surface configured to support the substrate; and a surface conditioner comprising at least one conditioning tool configured to contact the surface to be conditioned so as to condition the surface.
An optical assembly for a topography measurement system, the optical assembly comprises: a first reflector; a second reflector; and a third reflector located such that the second reflector is located along an optical path between the first reflector and the third reflector; wherein a focal length of the first reflector is different from a focal length of the third reflector such that the optical assembly has a magnification dependent on a ratio of the focal length of the first reflector to the focal length of the third reflector.
G01B 11/26 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des angles ou des cônesDispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour tester l'alignement des axes
G01B 11/24 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des contours ou des courbes
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
37.
ELECTROSTATIC OBJECT SUPPORT AND METHODS OF MANUFACTURE THEREOF
Disclosed is an electrostatic object support for supporting an object. The electrostatic object support comprises a base layer; an electrode on said base layer and at least one dielectric layer extending fully over the electrode, wherein the at least one dielectric layer comprises a first coated dielectric sub-layer being comprised of a first dielectric material and a second coated dielectric sub-layer being comprised of a second dielectric material.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A test substrate is provided. The test substrate includes a substrate, and a plurality of projections formed on one of the major surfaces of the substrate. A method of determining the condition of the main body of a substrate support of a substrate clamp of a lithographic apparatus is provided. The method includes obtaining a main body of a substrate support, wherein the main body is for forming projections on to thereby form the substrate support; clamping a test substrate to the main body; and measuring a property of the test substrate when clamped to the main body.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G01B 11/30 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la rugosité ou l'irrégularité des surfaces
A method for bonding substrates, the method comprising: applying a first bending force to bend a first substrate along a first axis; bringing the first substrate into contact with a second substrate to provide a zone of contact between the first substrate and the second substrate along the first axis; and releasing the first substrate from the first bending force.
The present invention concerns a system, comprising a stage for supporting a substrate and a control system for controlling movement of the stage. The control system is configured to determine an in-situ mass of the substrate, and control a position of the stage depending on the determined in-situ mass of the substrate.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A wavelength selection system comprising an actuatable reflector configured to reflect a radiation beam, and an optical filter configured to receive the reflected radiation beam, wherein the actuatable reflector is moveable between different orientations which direct the radiation beam to different positions on the optical filter, or at different angles of incidence on the optical filter, such that the optical filter selectively filters different wavelengths of the radiation beam, and wherein the wavelength selection system further comprises a dispersive element configured to apply wavelength dispersion to the radiation beam before the radiation beam is incident upon the optical filter.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
42.
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
Provided is a method of determining a performance parameter comprising determining a plurality of regions on a substrate; determining a plurality of performance parameter estimation models corresponding to the plurality of regions; determining performance parameter estimation model parameters for the plurality of performance parameter estimation models and applying at least one of the plurality of performance parameter estimation models with the determined model parameters to determine the performance parameter for the corresponding region of the plurality of regions.
A method of determining a positional instability of an image sensor. The method comprises introducing the image sensor to an operational environment. The method comprises performing a first set of measurements of a position of a target image using the image sensor to determine a first set of results indicative of a first position of the image sensor within the operational environment. The method comprises removing the image sensor from the operational environment. The method comprises reintroducing the image sensor to the operational environment. The method comprises performing a second set of measurements of a position of the target image using the image sensor to determine a second set of results indicative of a second position of the image sensor within the operational environment. The method comprises determining the positional instability of the image sensor at least partially based on the first and the second sets of results.
A charged-particle tool including: a condenser lens array configured to separate a beam of charged particles into a first plurality of sub-beams along a respective beam path and to focus each of the sub-beams to a respective intermediate focus; an array of objective lenses, each objective lens configured to project one of the plurality of sub-beams onto a sample; a corrector including an array of elongate electrodes, the elongate electrodes extending substantially perpendicular to the beam paths of the first plurality of sub-beams and arranged such that a second plurality of the sub-beams propagate between a pair of the elongate electrodes, the second plurality of sub-beams being a subset of the first plurality of sub-beams; and an electric power supply configured to apply a potential difference between the pair of elongate electrodes so as to deflect the second plurality of sub-beams by a desired amount.
A method for training a machine learning model to generate a predicted measured image, the method including obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G06T 7/32 - Détermination des paramètres de transformation pour l'alignement des images, c.-à-d. recalage des images utilisant des procédés basés sur la corrélation
G06T 7/33 - Détermination des paramètres de transformation pour l'alignement des images, c.-à-d. recalage des images utilisant des procédés basés sur les caractéristiques
G06V 10/774 - Génération d'ensembles de motifs de formationTraitement des caractéristiques d’images ou de vidéos dans les espaces de caractéristiquesDispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant l’intégration et la réduction de données, p. ex. analyse en composantes principales [PCA] ou analyse en composantes indépendantes [ ICA] ou cartes auto-organisatrices [SOM]Séparation aveugle de source méthodes de Bootstrap, p. ex. "bagging” ou “boosting”
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
46.
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
A source control arrangement for a radiation source including a hollow-core photonic crystal fiber (HC-PCF) having a hollow core with a core diameter, the arrangement including a pulse chirping arrangement configured to receive pulsed pump radiation and controllably chirp the pulsed pump radiation so as to output chirped pulsed pump radiation for exciting a working medium within the hollow core of the fiber at a pressure. The arrangement operable to configure one or more source parameters of the radiation source, which include one or both of the pressure and a pulse chirp parameter, such that the chirped pulsed pump radiation undergoes a spectral broadening process within the HC-PCF, thereby generating an output radiation having a predefined spectrum for a reference core diameter of the HC-PCF, so as to compensate for variation in the core diameter with respect to the reference core diameter.
Systems, methods, and computer software are disclosed for reducing wafer patterning errors caused by a mask device. One method (300) can include obtaining a first mask design (310) having a first portion (324) associated with an optimized pupil (322), where the optimized pupil results from a source-mask optimization process (320). An error can be located on the mask device and a second portion (330) of the mask device with the error can be identified. The method can also include performing source optimization (340) by utilizing the first portion (324) and the second portion (330) in combination to generate a reoptimized pupil (350).
G03F 1/36 - Masques à correction d'effets de proximitéLeur préparation, p. ex. procédés de conception à correction d'effets de proximité [OPC optical proximity correction]
G01N 21/956 - Inspection de motifs sur la surface d'objets
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
48.
POSITIONING SYSTEM, LITHOGRAPHIC TOOL AND METHOD FOR POSITIONING A MOVEABLE OBJECT USING A POSITIONING SYSTEM
The invention provides a positioning system for positioning a movable object, comprising:
multiple actuators arranged to move the movable object in one or more degrees of freedom, wherein the multiple actuators comprise more actuators than the one or more degrees of freedom,
a control system comprising a controller to provide control signals on the basis of a set-point and/or a control error, and a transformation matrix to transform the control signals into actuator inputs for the multiple actuators,
wherein the transformation matrix comprises transformation values for each relationship between one of the control signals and one of the actuator inputs, wherein the transformation values are selected in dependence of an intended trajectory of the movable object and/or wherein, in use, the transformation values are adjustable in dependence of one or more actual performance related parameters of the positioning system.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A stack of planar elements for a charged particle-optical module configured to project charged particles along a beam path, the stack comprising: a pair of adjoining planar elements arranged across the beam path, wherein one of the planar elements comprises an alignment fiducial and the other of the planar elements comprises a monitoring aperture; wherein the pair of planar elements are positioned relative to each other such that the alignment fiducial and the monitoring aperture are aligned with each other in a direction substantially perpendicular to a plane of the planar elements.
Cleaning contamination particles from a clamp of a lithography apparatus is described. Used clamps have burl tops contaminated with contamination particles to be cleaned before returning to service. Currently, to fully clean the burl tops of such a clamp, a hard and electrically conductive coating that covers the burl tops is stripped and a fresh coating is applied. This involves disconnecting a clamp from a chuck, stripping various coatings from non-burl areas of the clamp, and removing high voltage connections. Thereafter, high voltage connections are rebuilt, various coatings are reapplied, and the clamp is then qualified. Finally, the clamp is re-connected to the chuck, and manufacturing may continue. A new cleaning method enables the cleaning of the burl tops without needing to disconnect the clamp or to take the caps off to perform burl top refresh, which can save hours or weeks of downtime.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
B08B 1/10 - Nettoyage par des procédés impliquant l'utilisation d'outils caractérisé par le type d'outil de nettoyage
B08B 1/30 - Nettoyage par des procédés impliquant l'utilisation d'outils par le mouvement d’éléments de nettoyage sur une surface
B08B 3/08 - Nettoyage impliquant le contact avec un liquide le liquide ayant un effet chimique ou dissolvant
B08B 7/00 - Nettoyage par des procédés non prévus dans une seule autre sous-classe ou un seul groupe de la présente sous-classe
C11D 3/04 - Composés inorganiques solubles dans l'eau
G01B 11/30 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la rugosité ou l'irrégularité des surfaces
G01N 15/075 - Recherche de la concentration des suspensions de particules par des moyens optiques
A charged particle-optical module (41) for directing charged particles along a path towards a sample location, the charged particle-optical module comprises: a plurality of planar elements or electrodes (61-64) arranged across the path and configured to operate on the charged particles; a thermal conditioning channel 80 spaced from the planar elements in a direction through the plurality of elements; and a thermally conductive plate (61-64; 240; 75) connected to the thermal conditioning channel for transferring heat towards the thermal conditioning channel; wherein the thermally conductive plate extends between the planar elements and the thermal conditioning channel in a direction parallel to one or more of the planar elements.
One embodiment provides a method comprising obtaining a Fourier transform of an interference pattern, obtaining a central band component from the Fourier transform of the interference pattern, obtaining a sideband component from the Fourier transform of the interference pattern, obtaining a central band inverse Fourier transform image by performing an inverse Fourier transform of the central band component, obtaining a sideband inverse Fourier transform image by performing an inverse Fourier transform of the sideband component, and determining a fringe height reduction factor, the fringe height reduction factor corresponding to an interference fringe height reduction due to motion blur in the interference pattern, based on a comparison between the sideband inverse Fourier transform image and the central band inverse Fourier transform image.
G02B 21/36 - Microscopes aménagés pour la photographie ou la projection
G03H 1/00 - Procédés ou appareils holographiques utilisant la lumière, les infrarouges ou les ultraviolets pour obtenir des hologrammes ou pour en obtenir une imageLeurs détails spécifiques
G03H 1/04 - Procédés ou appareils pour produire des hologrammes
G03H 1/08 - Procédés ou appareils pour produire des hologrammes pour faire des hologrammes synthétiques
G06T 5/10 - Amélioration ou restauration d'image utilisant le filtrage dans le domaine non spatial
G06T 5/73 - Élimination des flousAccentuation de la netteté
G02B 21/18 - Aménagements avec plus d'un parcours de lumière, p. ex. pour comparer deux échantillons
G03H 1/26 - Procédés ou appareils adaptés spécialement pour produire des hologrammes multiples ou pour en obtenir des images, p. ex. procédés pour l'holographie à plusieurs couleurs
Systems and methods for initializing an extreme ultraviolet (EUV) source are discussed. The EUV radiation source may include a droplet generator configured to generate a stream of droplets of a target material, a laser source communicatively coupled to a controller. The laser source is configured to generate a first pulsed beam of light, which upon interaction with a droplet, initiates a modification of a shape of the droplet, forming a modified droplet, and generate a second pulsed beam of light configured to substantially evaporate the modified droplet, thereby generating pulses of EUV light. The EUV radiation source comprises a first actuator communicatively coupled to the controller and configured to adjust a width of the second pulsed beam to minimize a variation of energy of the pulses of EUV light.
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
A grid dependency check for a simulation model is described. According to embodiments, a grid dependency check can be advantageously performed faster and more efficiently compared to prior grid dependency checks. Certain portions of a design layout are selected and cropped to a minimum size required by the model, and used to generate a second design layout. The selected portions are rotated and/or shifted relative to the grid to form one or more moved portions. The second design layout includes the one or more selected portions and the one or more moved portions so that a modeling operation (e.g., model apply) needs to only run a single time instead of multiple times as in prior grid dependency checks.
G06F 30/398 - Vérification ou optimisation de la conception, p. ex. par vérification des règles de conception [DRC], vérification de correspondance entre géométrie et schéma [LVS] ou par les méthodes à éléments finis [MEF]
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
55.
POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, METHOD TO DRIVE A MOVABLE SUPPORT OF A POSITIONING SYSTEM AND METHOD COMPRISING A PATTERNED RADIATION BEAM ONTO A SUBSTRATE
The invention provides a positioning system for positioning an object. The positioning system comprises a movable support (PW) to support the object (W), one or more actuators (MAC) to exert a driving force on the movable support (PW), a control system to control the one or more actuators to move the movable support towards a desired position, and a potential energy release device (PER) connected to the movable support (PW) and configured to release potential energy during acceleration of the movable support (PW) to increase acceleration of the movable support body.movable support body
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Disclosed is a method comprising: obtaining measurement data relating to scattered radiation, having been scattered by a structure of interest and captured on at least one detector; determining at least a magnitude of a derivative of the phase of at least one component of said scattered radiation from said intensity; and determining at least one parameter of interest of said structure of interest from said at least the magnitude of the derivative of the phase.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
57.
PCA COMPONENT, ELECTRIC MOTOR, POSITIONING SYSTEM, AND LITHOGRAPHIC APPARATUS
Disclosed is a PCA component for a coil assembly (CAS), comprising a PCA component body (COB) and a covering plate (COP). The PCA component body has one or more conductive traces (TRA) and one or more electronic components, wherein the one or more conductive traces (TRA) and one or more electronic components are embedded in the PCA component body. The covering plate (COP) is mounted on the PCA component body. The PCA component body and the covering plate define one or more recesses to receive one or more coils of the coil assembly at least partially therein. The PCA component can be used as a coil carrier (COC), or part thereof, to accommodate one or more coils of the coil assembly. The coil carrier (COC) may be part of an electric motor.
H02K 41/03 - Moteurs synchronesMoteurs pas à pasMoteurs à réluctance
H02K 11/25 - Dispositifs pour détecter la température ou actionnés par des valeurs de cette variable
H02K 3/26 - Enroulements caractérisés par la configuration, la forme ou le genre de construction du conducteur, p. ex. avec des conducteurs en barre constitués par des conducteurs imprimés
58.
SUBSTRATE SUPPORT MANUFACTURING AND/OR RECONDITIONING SYSTEM
A standalone system for manufacturing and/or reconditioning terminal surfaces of a plurality of projections of a substrate support. The system includes one or more rotatable treatment tools arranged to remove matter from the projections of the substrate support when rotating, and a controller arranged to control the operation of the one or more treatment tools.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
59.
METHODS OF LITHOGRAPHY ON A RECONSTITUTED SUBSTRATE
Disclosed is a method of determining a correction for performing a lithographic exposure on a reconstituted substrate, said reconstituted substrate comprising a base substrate with a plurality of substrate portions bonded thereto, said substrate portions having been diced from one or more pre-diced substrates The method comprises: obtaining positional data describing a position of features in at least an uppermost layer of said one or more pre-diced substrates; and using said positional data to determine said correction for performing the lithographic exposure on the reconstituted substrate.
A radiation source includes a vessel coupled to an exhaust; a droplet generator aligned with a droplet catch; a reservoir coupled to the droplet catch; and a conduit providing fluid communication between the exhaust and the reservoir. A method of operating a radiation source includes flowing under gravity droplet material from a droplet catch in a radiation source to a reservoir and flowing under gravity droplet material from an exhaust in the radiation source to the reservoir.
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
09 - Appareils et instruments scientifiques et électriques
Produits et services
Fittings and accessories for lithographic machines, included in this class. Electronic and optical apparatus and instruments; data-processing apparatus and software for use with lithographic machines.
62.
Method and Device for Machining a Wafer-Holding Device for a Wafer Lithography Process
A method for machining a wafer-holding device 10 for a wafer lithography process, such as e.g. immersion lithography or lithography under vacuum conditions, the wafer-holding device 10 comprising a carrier body 11 having an electrically conductive diamond cover layer 12. An electrochemical cell 20 is formed on the wafer-holding device 10 by the diamond cover layer 12, a counter electrode 21, an electrolyte liquid 22 in a gap between the diamond cover layer 12 and the counter electrode 21, and a voltage source 23 which is electrically connected to the diamond cover layer 12 and the counter electrode 21. Material is removed electrochemically on the wafer-holding device by means of the electrochemical cell 20. A surface machining device 200 is also described which is designed to machine a wafer-holding device 10 for a wafer lithography process.
B23H 3/00 - Usinage électrochimique, c.-à-d. enlèvement de métal par passage de courant entre une électrode et une pièce en présence d'un électrolyte
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A coupling having a variable stiffness, the coupling including: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component includes a viscoelastic material, wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may have the coupling.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
F16F 1/377 - Ressorts en matière plastique, p. ex. en caoutchoucRessorts faits d'un matériau à friction intérieure élevée caractérisés par une forme particulière présentant des trous ou des ouvertures
F16F 1/44 - Ressorts en matière plastique, p. ex. en caoutchoucRessorts faits d'un matériau à friction intérieure élevée caractérisés par le mode de travail travaillant principalement à la compression
64.
ENHANCED ALIGNMENT APPARATUS FOR LITHOGRAPHIC SYSTEMS
Disclosed is a metrology apparatus in which some of the measurement radiation that has interacted with a mark is split into channels or arms and then each channel or arm is spatially separated. In some versions the alignment information comprises polarization channel intensity information. In other versions the alignment information comprises color channel intensity information.
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
65.
METHOD OF DETERMINING A SPECTRAL WEIGHTING FOR METROLOGY METHODS AND ASSOCIATED APPARATUSES
Disclosed is a method for determining a spectral weighting for configuring spectral characteristics of broadband measurement illumination. The method comprises obtaining first metrology data comprising metrology data from at least a first proper subset of a plurality of targets on a substrate, respectively for each of a plurality of different illumination conditions; determining a respective first spectral weighting component for each target of at least a second proper subset of targets from said first metrology data, said first spectral weighting component being determined to provide a substantially wavelength independent mean intensity from each respective said target; determining a respective second spectral weighting component for each target of at least the second proper subset of targets from said first metrology data; and determining a respective spectral weighting for each target of at least the second proper subset of targets from said first spectral weighting component and said second spectral weighting component.
A radiation source includes a source vessel configured to generate an extreme ultraviolet light, and a scrubber. The scrubber includes a housing and a plurality of fins arranged in the housing. One or more fins in the plurality of fins contain a heating element disposed across a surface of the fin, and the heating element is positioned in a flow volume of the scrubber.
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
Embodiments herein describe methods, devices, and systems for a reticle gripper. The disclosure provides a reticle handler apparatus comprising: a reticle handler. At least one reticle handler arm comprising: a static structure that is connected to the reticle handler, an end part for holding a reticle, a spring-damper system connecting the end part to the static structure, and a locking mechanism having a first or locked position. The end part is substantially fixated with respect to the static structure and a second or unlocked position. The end part is able to move within a predetermined range with respect to the static structure.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Systems and methods for providing variable spot size and variable focus at a substrate are described. Sets of variable focal length lenses can be added to an alignment system to allow for adjustment of the spot size and focus. A variable focal length lens is a liquid lens that is tunable based on application of voltage across the lens. Toggling the voltage changes the water-oil interface in the liquid lens, which in turn changes the direction of light passing through. For example, turning on the voltage across the lens shifts the light output direction to converging at a focal point. As a result, variable focal length lenses provide adjustment to compensate for the fixed spot size and focus shortcomings of the prior art. Furthermore, variable focal length lenses can also be applied to compensate for spot shift and higher order diffraction orders.
G02B 7/10 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles avec mécanisme de mise au point ou pour faire varier le grossissement par déplacement axial relatif de plusieurs lentilles, p. ex. lentilles d'objectif à distance focale variable
Method of determining a refractive index of a membrane associated with an image sensor, the method comprising the steps of obtaining a first diffraction pattern of a first patterned membrane section, the first patterned membrane section having a first membrane-to-open ratio, and obtaining a second diffraction pattern of a second patterned membrane section, the second patterned membrane section having a second membrane-to-open ratio, the second membrane-to-open ratio being different from the first membrane-to-open ratio, and determining a refractive index of the membrane based on the first diffraction pattern and the second diffraction pattern.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (USA)
Inventeur(s)
De Rooij, Raoul, Stefan
Leunissen, Leonardus, Hendrikus, Albertino
Zdravkov, Aleksandar, Nikolov
Nadir, Kerim
Voronina, Victoria
Ruzic, David, Neil
Bramble, James, Roger
Robertson, Jaime, Alexander
Abrégé
A measuring system for determining a property of one or more contaminants on a component related to a lithographic process, the measuring system comprising a first mass sensor comprising a first sensing face and configured to provide a first signal indicating increases and decreases in mass on the first sensing face. The measuring system further comprises a second mass sensor comprising a second sensing face and configured to provide a second signal indicating increases and decreases in mass on the second sensing face and a controller. The controller is configured to, in use: receive, from the first mass sensor, the first signal, receive, from the second mass sensor, the second signal, and determine, based on the first and second signals, the property of the contaminant.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
71.
METHOD OF MANUFACTURING AN OBJECT SUPPORT AND OBJECT SUPPORT
An object support and a method for manufacturing the object support, wherein the support comprises a body having a main body surface configured to support an object. The method comprising the steps of: providing the body in a CVD chamber; growing a first layer by co-depositing diamond and SiC on the main body surface; and growing a second layer by depositing diamond on the first layer, wherein the first layer is a composite layer comprising diamond and SiC.
The present disclosure relates to a charged particle-optical element for a charged particle beam apparatus, wherein the charged particle-optical element is configured to operate on a plurality of beamlets of charged particles, and the charged particle-optical element comprises: a first electrode, wherein a plurality of first apertures for passage of the plurality of beamlets are defined in a beam 5 area of the first electrode; and a second electrode, wherein a plurality of second apertures for passage of the plurality of beamlets are defined in a beam area of the second electrode, wherein the first electrode is configured to adopt a target curved profile upon application of a potential difference between the first electrode and the second electrode.
The invention provides a shutter assembly for use in a lithographic apparatus that comprises a shutter and an actuator device for moving the shutter between a closed position and an opened position, wherein an opening duration during which the shutter is moved from the closed position to the opened position differs from a closing duration during which the shutter is moved from the opened position to the closed position.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
74.
DEFECT MAP BASED D2D ALIGNMENT OF IMAGES FOR MACHINE LEARNING TRAINING DATA PREPARATION
A method for die-to-die (D2D) image alignment using a defect map associated with an image. The method includes accessing a set of images of a substrate, which correspond to different image capture conditions. The locations of various defects on the set of images are obtained and a defect map indicating relative locations of at least some of the defects is generated. The set of images are aligned with each other using the defect map to generate an aligned set of images.
G06T 7/33 - Détermination des paramètres de transformation pour l'alignement des images, c.-à-d. recalage des images utilisant des procédés basés sur les caractéristiques
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Methods, computer programs, and systems are disclosed, with one method including characterizing a depth variation of a predicted result within a feature of a pattern from a lithography simulation. The method evaluates the depth variation characterization and selects patterns or gauges based on the depth variation evaluation. In some embodiments, the evaluating can be based on an aerial image (AI) depth sensitivity having the depth variation.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
76.
GAS FLOW APPARATUS AND METHOD FOR USE IN AN OPTICAL SYSTEM
A gas flow apparatus for use in an optical system comprising an optical element defining an optical surface, wherein the gas flow apparatus comprises a structure that is arranged to define an enclosure that is partially closed by the optical surface, when the gas flow apparatus is in use. The structure defines an aperture for radiation to propagate to or from the optical surface. A gas system is provided to provide a gas into the enclosure defined by the structure. Herewith, at least a portion of the gas is directed to swirl about an optical axis of the optical element. The gas has a component of velocity directed from the optical surface towards the aperture defined by the structure. A gas extractor may be arranged to extract gas from a volume that is in fluid communication with the optical surface.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G02B 27/00 - Systèmes ou appareils optiques non prévus dans aucun des groupes ,
An air gauge includes at least one nozzle arranged to expel gas into a gap between the nozzle and a surface and also includes at least one tap for communicating a pressure in the gap to a pressure sensor, wherein the nozzle and the gap are displaced from one another to mitigate the effects of turbulence from the nozzle on the magnitude of the pressure communicated by the tap.
G01B 13/06 - Dispositions pour la mesure caractérisées par l'utilisation de fluides pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
78.
AN ELECTROSTATIC WAFER CLAMP AND A METHOD OF UNLOADING A WAFER THEREFROM
The invention provides a method of unloading a wafer from an electrostatic wafer clamp having one or more electrodes for clamping the wafer on the wafer clamp, the method comprising: decreasing a clamp voltage of the one or more electrodes of the wafer clamp according to a rampdown pattern from a first, higher voltage to a second, lower voltage; and lifting the wafer from the wafer clamp using a wafer lift arrangement; wherein, prior to the wafer being lifted from the wafer clamp by a first height: the rampdown pattern includes a voltage modulation part prior to reaching the second, lower voltage, said voltage modulation part comprising at least one voltage spike having an opposite polarization and an amplitude of at least 20% of said first, higher voltage; and/or said second, lower voltage has an amplitude in the range of between 5% and 20% of the first, higher voltage.
A method for training a prediction model to generate a high-resolution image representing defects on a substrate from a low-resolution image of the substrate. The method includes inputting a first image and a reference image of defects on a substrate, which are representative of images captured using different image capture conditions, to a neural network. The neural network is executed to generate a predicted image in response to the first image. A loss function that is indicative of a difference between a defect distribution in the predicted image and a defect distribution in the reference image is calculated and the neural network is modified based on the loss function. The neural network may be trained until the loss function is minimized.
Disclosed is a method for calibrating a prediction model for predicting a failure probability of a device manufactured by a semiconductor manufacturing process based on performance parameter data relating to a performance parameter of said device. The method comprises obtaining calibration performance parameter data and corresponding reference data; optimizing one or more calibration parameters of the prediction model so as to improve prediction performance of said prediction model, wherein said one or more calibration parameters comprises one or more of: an upper specification calibration parameter or an upper specification delta calibration parameter thereof, a lower specification calibration parameter or lower specification delta calibration parameter thereof, a scaling calibration parameter for scaling a scale parameter of the prediction model, a location parameter nuisance calibration parameter, a skewness calibration parameter and/or a kurtosis calibration parameter.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
81.
METHOD OF FEED-FORWARD CORRECTION, AND COMPUTER PROGRAM FOR FEED-FORWARD CORRECTION
A method of feed-forward correction comprising: determining feed-forward corrections based on measurements on a patterning device of a lithographic apparatus of a deformation parameter indicative of deformation of the patterning device before and after exposure by the lithographic apparatus of a substrate of a first series of substrates, wherein the feed-forward corrections are to be applied during exposure by the lithographic apparatus of a substrate of a second series of substrates.
STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN (Pays‑Bas)
UNIVERSITEIT VAN AMSTERDAM (Pays‑Bas)
ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
Koolen, Armand, Eugene, Albert
Pandey, Nitesh
Noordam, Marcus, Lambertus
Den Boef, Arie, Jeffrey
Goossens, Thomas
Abrégé
A method of determining a parameter of interest of a semiconductor manufacturing process comprising obtaining at least a first value and at least a second value of radiation as detected by a detector configured to detect radiation scattered by a metrology target, determining at least an intermediate first value from a relation between the first value and the second values of radiation 5 obtaining at least a third value and at least a fourth value of radiation as detected by a detector configured to detect radiation scattered by the metrology target, determining at least an intermediate second value from a relation between the third value and the fourth value of radiation determining a parameter of interest of a semiconductor manufacturing process from relation between the at least first intermediate value of radiation and the second intermediate value of radiation.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03H 1/08 - Procédés ou appareils pour produire des hologrammes pour faire des hologrammes synthétiques
G03H 1/04 - Procédés ou appareils pour produire des hologrammes
A method of manufacturing an EUV reticle for an EUV exposure apparatus comprises providing a first substrate comprising a reflective layer configured to reflect EUV light and an absorbent layer configured to absorb the EUV light, exposing the first substrate to a patterned radiation beam and developing the exposed first substrate to form a patterned surface comprising the reflective layer and the absorbent layer. The first substrate is placed onto a reticle stage carrier to form the EUV reticle. The substrate may be a semiconductor substrate.
A method comprises scanning one or more features on a sample using a charged-particle beam having a first beam profile to obtain a first signal, and scanning the one or more features on the sample using a charged-particle beam having a second beam profile to obtain a second signal. The first and second signals are compared and one or more parameters of the one or more features are determined based on the comparison.
A stage for die placement comprises a support member; a movable member that is movable relative to the support member, wherein the movable member is configured to hold at least one die; and an actuator configured, on actuation, to move the movable member relative to the support member in six degrees of freedom.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
H02K 41/035 - Moteurs à courant continuMoteurs unipolaires
86.
METHOD OF DETERMINING A PARAMETER ASSOCIATED WITH A FLUID HANDLING STRUCTURE AND/OR WETTABILITY OF A SUBSTRATE IN IMMERSION LITHOGRAPHY AND LITHOGRAPHIC APPARATUS CONFIGURED TO PERFORM THE METHOD
The present disclosure relates to methods for a lithographic apparatus comprising a fluid handling structure configured to confine a fluid to a region of a surface of a substrate. The methods are for determining a parameter associated with the fluid handling structure and/or the wettability of the substrate. Some methods comprise causing a movement of the fluid handling structure relative to the substrate, wherein a speed of the fluid handling structure relative to the substrate during the movement varies as a function of the position of the fluid handling structure relative to the substrate; and then inspecting the surface of the substrate. Some methods comprise causing a movement of the fluid handling structure relative to the substrate, wherein the fluid handling structure passes over a fluid-pinning feature during the movement of the fluid handling structure relative to the substrate; and then inspecting the surface of the substrate.
A charged particle assessment system comprising a sample holder configured to hold a sample having a surface; a charged particle-optical device configured to project a charged particle beam towards the sample, the charged particle-optical device being configured to deflect the charged particle beam over a part of the surface of the sample, the charged particle-optical device having a device surface, the device surface facing, in use, the surface of the sample; a projection assembly arranged to direct a plurality of light beams along respective light paths, wherein the plurality of light beams include light beams having different wavelengths; and wherein the device surface comprises a plurality of redirecting elements, each of the redirecting elements being associated with one of the respective wavelengths, wherein each of the redirecting elements is configured to direct light onto the sample.
H01J 37/02 - Tubes à décharge pourvus de moyens permettant l'introduction d'objets ou d'un matériau à exposer à la décharge, p. ex. pour y subir un examen ou un traitement Détails
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/153 - Dispositions électronoptiques ou ionoptiques pour la correction de défauts d'images, p. ex. stigmateurs
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H01J 37/244 - DétecteursComposants ou circuits associés
An electron-optical projection device for projecting at least one charged particle beam towards a sample, the device comprising: a beam directing element configured to project the at least one charged particle beam towards a sample location on the sample, wherein the electron-optical projection device further comprises an optical member configured to direct stimulation light towards the sample so that the stimulation light is at least partially coincident with the at least one charged particle beam, wherein the optical member comprises a first surface facing down-beam, at least part of the first surface comprising a coating layer being at least partially transparent for the stimulation light and being electrically conductive.
H01J 37/02 - Tubes à décharge pourvus de moyens permettant l'introduction d'objets ou d'un matériau à exposer à la décharge, p. ex. pour y subir un examen ou un traitement Détails
H01J 37/153 - Dispositions électronoptiques ou ionoptiques pour la correction de défauts d'images, p. ex. stigmateurs
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/244 - DétecteursComposants ou circuits associés
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
89.
RETICLE CLAMP, EXPOSURE APPARATUS INCLUDING RETICLE CLAMP, AND METHOD
Embodiments herein describe methods, devices, and systems for a reticle stage provided with an electrostatic clamp. The disclosure provides an electrostatic clamp system for holding an object by electrostatic clamping force, the clamp system comprising a clamp provided with a plurality of burls to support the object and at least one electrode configured to generate the electrostatic clamping force, and a controller connectable to the at least one electrode and configured to vary the electrostatic clamping force dependent on acceleration of the clamp.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
There is provided a method for determining a property of an illumination system, the method comprising: using the illumination system to illuminate photoluminescent material provided at a first location; using the illumination system to illuminate photoluminescent material provided at a second location, the first and second locations being distinct; detecting co-existing photoluminescence emitted from the locations; and, determining the property of the illumination system at least partially based on the detected co-existing photoluminescence. There is also provided a sensor system for determining a property of an illumination system, the sensor system comprising: photoluminescent material provided at first and second locations for being illuminated by the illumination system, the first and second locations being distinct; an image sensor configured to detect co-existing photoluminescence emitted from the first and second locations; and, a processor configured to determine the property of the illumination system at least partially based on the detected co-existing photoluminescence.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A sensor system for measuring the height of a substrate surface, the sensor system comprising: a projection system comprising a radiation source configured to emit a beam of radiation and further comprising a projection grating configured to diffract the beam of radiation to form a first diffraction order and an additional diffraction order, the projection system being configured to direct the first diffraction order and the additional diffraction order onto the substrate to form a grating image; a detection system configured to detect a position or phase of the radiation beam first diffraction order after reflection from the substrate, and configured to detect a position or phase of the radiation beam additional diffraction order after reflection from the substrate; and a processor configured to use the detected positions or phases of first and additional diffraction orders to determine a measurement of the height of the substrate.
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
92.
METHOD OF TILT METROLOGY AND ASSOCIATED APPARATUSES
Disclosed is metrology method comprising: obtaining metrology data relating to a measurement of at least one target, each said at least one target comprising a plurality of features; said metrology data describing a placement error of one or more pairs of corresponding features of said at least one target, each one or more pairs of corresponding features comprising pairs of features which are substantially equidistant from a reference point on the target in a measurement direction of the target; determining an asymmetric component of said placement error from said metrology data; and determining a tilt parameter from said asymmetric component.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
93.
METHOD TO DETERMINE AN ABSOLUTE POSITION OF AN OBJECT, INTERFEROMETER SYSTEM, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS
The invention provides a method to determine an absolute position of an object using an interferometer system, comprising the steps of: providing a light beam; splitting the light beam in a measurement beam and a reference beam; guiding the measurement beam along a measurement path towards a reflective measurement surface on the object; guiding the reference beam along a reference path towards a reflective reference surface on a reference object; receiving the measurement beam after reflection on the reflective measurement surface and the reference beam after reflection on the reflective reference surface at a detector; measuring a phase signal based on the measurement beam and the reference beam received by the detector, separating a cyclic error phase component from the phase signal, determining the absolute position of the object on the basis of the cyclic error phase component.
The disclosed embodiments include a vacuum chamber that may include a vacuum chamber wall having a first wall layer and a second wall layer defining a gap therebetween, where the first wall layer is subjected to a heat source and the second wall layer is subjected to a cooling source. Also, the vacuum chamber may include a gas supply device connected to the gap and configured to supply a gas thereto. Furthermore, the vacuum chamber may include a controller connected to the gas supply device and configured to control pressure of the gas in the gap so as to control heat flow across the vacuum chamber wall.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
A stage for die placement comprises: a support member; a movable member that is movable relative to the support member, wherein the movable member is configured to hold at least one die; and an actuator configured, on actuation, to move the movable member relative to the support member so as to flip the die and move the die along a die path to place the die on an acceptor substrate, wherein the stage is arranged such that the die path extends further in a direction perpendicular to a plane of the acceptor substrate than in a direction parallel to the plane of the acceptor substrate.
A bonding tool comprises: a frame; a stage coupled to the frame, wherein the stage comprises a movable member configured to move relative to the frame such that an actuation force applied to the movable member causes a reaction force; and a balance mechanism configured to at least partly counteract the reaction force caused by the actuation force applied to the movable member.
The application provides a metrology tool, and a method, for determining parameters of interest of a structure on an object. This metrology tool comprises: an illumination branch configured for providing an illumination beam; a spectral shaping device for spectrally shaping the illumination beam providing a spectrum comprising at least two disjunct wavelength bands; a controller and a 5 detection branch configured for detecting signals relating to a diffracted beam, the beam comprising diffracted sub-beams, wherein the signals enable determining parameters of interest. The illumination branch is further configured for illuminating the structure on the object which results in the diffracted beam. Each of the diffracted sub-beams is associated with one of the at least two disjunct wavelength bands. The controller is configured for selecting the spectrum allowing distinguishably acquiring the 0 signals from respective diffracted sub-beams and the controller is configured for controllably setting the spectral shaping device to provide the spectrum.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G01N 21/956 - Inspection de motifs sur la surface d'objets
A humidifier device for generating a purge gas for a lithographic apparatus, the device comprising: a first gas inlet configured to receive a first flow of a first gas; a second gas inlet configured to receive a second flow of the first gas; an enricher configured to generate an enriched gas flow comprising the second flow of the first gas and water or hydrogen peroxide; and a mixer configured to mix the first flow of the first gas with an enriched gas derived from the enriched gas flow to generate the purge gas.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
99.
SENSOR HEAD, METROLOGY SYSTEM AND LITHOGRAPHIC APPARATUS
Disclosed is a photonic integrated circuit metrology sensor head comprising a radiation splitter, a plurality of measurement units, comprising a measurement unit per channel of said plurality of channels, and a radiation combiner operable to combine the captured radiation subsequent to said interfering; wherein said plurality of measurement units comprise: a plurality of first type measurement units, each first type measurement unit for performing metrology in a first direction or a second direction, each said first direction and second direction being parallel to said reference plane; and a plurality of second type measurement units, each second type measurement unit for performing metrology in a third direction, said third direction being perpendicular to said first direction and second direction.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p. ex. automatique
100.
SYSTEMS AND METHODS FOR GENERATING EUV RADIATION FROM LASER-PRODUCED PLASMAS
Systems and methods for generating extreme ultraviolet (EUV) radiation using a laser-produced plasma EUV radiation source are discussed. The EUV radiation source may include a droplet generator configured to generate a plurality of droplets of a target material, and a laser source configured to generate a plurality of pulses of light interacting with a droplet of the plurality of droplets to form a plasma comprising extreme ultraviolet (EUV) radiation. The plurality of pulses of light comprise a first pulse configured to initiate a modification of a shape of the droplet, thereby forming a modified droplet, a second pulse configured to reduce a density of the modified droplet, thereby forming a rarefied droplet, and a third pulse configured to substantially ionize the rarefied droplet, wherein the second pulse comprises a light pulse having a wavelength in a range of 1.1 μm to 2.5 μm.
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
