Shibaura Mechatronics Corporation

Japon

 
Quantité totale PI 282
Rang # Quantité totale PI 4 556
Note d'activité PI 2,9/5.0    107
Rang # Activité PI 6 424
Symbole boursier 65900 (tse)
ISIN JP3355000005
Capitalisation 39879313920.0  (JPY)
Industrie Electronic Components
Secteur Technology

Brevets

Marques

122 0
0 0
160 0
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Dernier brevet 2024 - Substrate delivery apparatus and...
Premier brevet 1997 - Processor and processing method,...

Derniers inventions, produits et services

2024 Invention Substrate delivery apparatus and substrate delivery method. A substrate delivery apparatus and a...
Invention Film forming device. Provided is a film forming device that can make a boundary between electrode...
Invention Buffer device, mounting device, and mounting method. Provided are a buffer device, a mounting dev...
Invention Film forming apparatus. The present invention provides a film forming apparatus which is capable ...
Invention Cleaning device and mounting device. Provided are a cleaning device and a mounting device capable...
Invention Mounting device and mounting method. Provided are a mounting device and a mounting method with wh...
Invention Substrate separation device, substrate processing device, and substrate separation method. Provid...
Invention Substrate separation apparatus, substrate processing apparatus, and substrate separation method. ...
Invention Mounting tool and mounting apparatus. According to one embodiment, a mounting tool and a mountin...
Invention Drying apparatus, dry condition confirmation method, and wafer storage container cleaning apparat...
Invention Film forming apparatus. A film forming apparatus includes: a rotary table provided in a chamber;...
Invention Substrate processing apparatus and substrate processing method. According to one embodiment of t...
Invention Wafer storage container drying apparatus and cleaning system. According to one embodiment of the...
2023 Invention Vibrating body and substrate processing apparatus. A vibrating body according to an embodiment is...
Invention Cleaning apparatus. According to one embodiment of the present disclosure, a cleaning apparatus ...
Invention Substrate processing device. Provided is a substrate processing device that makes it possible to ...
Invention Substrate treatment apparatus and method for treating substrate. According to one embodiment a s...
Invention Cleaning apparatus for wafer storage container. According to an embodiment of the present disclo...
Invention Substrate processing apparatus. According to one embodiment, a substrate processing apparatus in...
Invention Film formation apparatus. A film formation apparatus includes: a chamber which an interior there...
Invention Electromagnetic wave attenuator, electronic device, film formation apparatus, and film formation ...
Invention Processing liquid supply device, substrate processing apparatus, and method for inspecting proces...
Invention Substrate processing apparatus and substrate processing method. According to one embodiment, a s...
Invention Processing liquid supply device, substrate processing apparatus, and processing liquid supply met...
Invention Substrate processing apparatus and substrate processing method. The substrate processing apparat...
2022 Invention Substrate transfer device and substrate transfer method. Provided are a substrate transfer device...
Invention Substrate transport carriage. Provided is a substrate transport carriage capable of transporting ...
Invention Substrate processing apparatus and substrate processing method. The present invention provides a ...
Invention Maintenance method and heat treatment apparatus. Provided is a maintenance method of a heat trea...
Invention Supply tank, supply device and supply system. According to one embodiment, provided is a supply ...
Invention Supply device and supply system. A supply device includes a collect tank which collects a proces...
Invention Film formation apparatus. According to one embodiment, a film formation apparatus that suppresse...
Invention Substrate treatment device. A substrate treatment device includes a placement platform rotating ...
Invention Substrate drying apparatus and substrate processing apparatus. A substrate drying apparatus and ...
Invention Substrate treatment device. A substrate treatment device according to an embodiment includes a pl...
Invention Heat treatment device. According to an embodiment of the present disclosure, a heat treatment de...
2021 Invention Film formation apparatus and film formation method. According to an embodiment, a film formation...
Invention Film deposition device and film deposition method. Provided are a film deposition device and a fi...
Invention Substrate carrying apparatus. A substrate carrying apparatus that can reduce attachment of dust t...
Invention Film formation apparatus. A film deposition apparatus reduces hillock formation while yielding un...
Invention Substrate processing apparatus. A substrate processing apparatus according to an embodiment of th...
Invention Substrate processing apparatus and substrate processing method. A substrate processing apparatus ...
Invention Substrate treatment method and substrate treatment apparatus. According to one embodiment, a sub...
Invention Cooling device, substrate treatment device, cooling method, and substrate treatment method. Accor...
Invention Substrate treatment device. According to one embodiment, a substrate treatment device includes a ...
Invention Substrate treatment device. According to one embodiment, q substrate treatment device includes a ...