LPE S.p.A.

Italie


 
Quantité totale PI 65
Rang # Quantité totale PI 20 679
Note d'activité PI 2,4/5.0    33
Rang # Activité PI 23 107
Classe Nice dominante Appareils et instruments scienti...

Brevets

Marques

23 4
0 0
32 4
2
 
Dernier brevet 2024 - Apparatus for manufacturing semi...
Premier brevet 1987 - Epitaxial reactors
Dernière marque 2020 - LPE
Première marque 2001 - LPE

Industrie (Classification de Nice)

Derniers inventions, produits et services

2024 Invention Apparatus for manufacturing semiconductor devices. Apparatus for manufacturing semiconductor dev...
Invention Method for removing layers of silicon carbide, as well as process and apparatus for cleaning epit...
2022 Invention Reaction chamber with covering system and epitaxial reactor. The reaction chamber (100) comprise...
Invention Reaction chamber with covering system and epitaxial reactor. The reaction chamber (100) comprises...
2021 Invention Method for cvd deposition of n-type doped silicon carbide and epitaxial reactor. The method serv...
Invention Method for cvd deposition of n-type doped silicon carbide and epitaxial reactor. The method serve...
Invention Reactor for epitaxial deposition with a heating inductor with movable turns. The present inventio...
Invention Tool for handling substrates with overhead screen and relevant handling methods and epitaxial rea...
2020 Invention Substrate support device for a reaction chamber of an epitaxial reactor with gas flow rotation, r...
Invention Treating arrangement with loading/unloading group and epitaxial reactor. The treating arrangemen...
Invention Treating arrangement with storage chamber and epitaxial reactor. The treating arrangement (900) ...
Invention Treating arrangement with transfer chamber and epitaxial reactor. The treating arrangement (900)...
Invention Treating arrangement with transfer chamber and epitaxial reactor. The treating arrangement (900) ...
Invention Treating arrangement with loading/unloading group and epitaxial reactor. The treating arrangement...
Invention Treating arrangement with storage chamber and epitaxial reactor. The treating arrangement (900) f...
P/S Equipment for semiconductor manufacturing including but not limited to: CVD (chemical vapor depo...
P/S Equipment for semiconductor manufacturing, namely, CVD (Chemical Vapor Deposition) and MOCVD (Met...
P/S Semiconductor manufacturing equipment, including but not limited to: CVD (chemical vapour deposit...
P/S Equipment for semiconductor manufacturing including CVD (chemical vapor deposition) and MOCVD (m...
Invention Reaction chamber for a deposition reactor with interspace and lower closing element and reactor. ...
Invention Reaction chamber comprising a rotating element for the deposition of a semiconductor material. T...
Invention Reaction chamber comprising a rotating element for the deposition of a semiconductor material. Th...
2019 Invention Deposition reactor with inductors and electromagnetic shields. The reactor (100) for deposition ...
Invention Deposition reactor with inductors and electromagnetic shields. The reactor (100) for deposition o...
Invention Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal...
2017 Invention Heating method for a reactor for epitaxial deposition and reactor for epitaxial deposition. The ...
Invention Heating method for a reactor for epitaxial deposition and reactor for epitaxial deposition. The p...
Invention Epitaxial deposition reactor with reflector external to the reaction chamber and cooling method o...
Invention Susceptor with substrate clamped by underpressure, and reactor for epitaxial deposition. The susc...
Invention Inductively heatable susceptor and epitaxial deposition reactor. The present invention concerns ...
Invention Inductively heatable susceptor and epitaxial deposition reactor. The present invention concerns a...
2016 Invention Tool for manipulating substrates, manipulation method and epitaxial reactor. The tool (1) for man...
Invention Susceptor with asymmetric recesses, reactor for epitaxial deposition and production method. This...
Invention Susceptor with supporting element. The present invention mainly relates to a susceptor for a reac...
2015 Invention Tool for manipulating substrates, manipulation method and epitaxial reactor. The tool (1 ) for ma...
2014 Invention Reaction chamber for epitaxial growth with a loading/unloading device and reactor. A reaction cha...
Invention Susceptor with curved and concentric grooves on the substrates support. The present invention rel...
Invention Susceptor with arched shape grooves on the substrates support surface. The present invention rela...
Invention Coated susceptor and anti-bowing method. The present invention relates to a susceptor for a react...
2010 Invention Manufacturing device for silicon carbide single crystal. A manufacturing device of a silicon car...
Invention Reaction chamber of an epitaxial reactor and reactor that uses said chamber. The present inventio...
2009 Invention Reaction chamber of an epitaxial reactor. The present invention relates to a reaction chamber of...
Invention Reaction chamber of an epitaxial reactor. The present invention relates to a reaction chamber of ...
2008 Invention Tool for handling a susceptor, and machine for treating substrates and/or wafers using it. The to...
2006 Invention Differentiated-temperature reaction chamber. The present invention relates to a reaction chamber...
2003 P/S Epitaxial reactors and components thereof, operational software for epitaxial reactors.
P/S EPITAXIAL REACTORS AND PARTS THEREFORE FOR USE IN DEPOSITING LAYERS OF SEMICONDUCTOR MATERIAL ONT...
2001 P/S Epitaxial reactors, operational software.
P/S Epitaxial reactors, operational software therefore