- All sections
- C - Chemistrymetallurgy
- C09G - Polishing compositionsski waxes
- C09G 1/02 - Polishing compositions containing abrasives or grinding agents
Patent holdings for IPC class C09G 1/02
Total number of patents in this class: 2283
10-year publication summary
|
158
|
161
|
187
|
212
|
200
|
192
|
192
|
197
|
192
|
95
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Fujimi Incorporated | 801 |
342 |
| CMC Materials LLC | 244 |
125 |
| Anji Microelectronics (Shanghai) Co., Ltd. | 151 |
107 |
| Resonac Corporation | 3503 |
107 |
| Versum Materials US, LLC | 677 |
104 |
| FUJIFILM Electronic Materials U.S.A., Inc. | 343 |
78 |
| BASF SE | 21313 |
73 |
| Entegris, Inc. | 2004 |
68 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48214 |
59 |
| Anji Microelectronics Technology (Shanghai) Co., Ltd. | 70 |
50 |
| DuPont Electronic Materials Holding, Inc. | 204 |
50 |
| JSR Corporation | 2551 |
35 |
| Cabot Microelectronics Corporation | 168 |
35 |
| K.C. Tech Co., Ltd. | 96 |
35 |
| Saint-Gobain Ceramics & Plastics, Inc. | 802 |
35 |
| Samsung Electronics Co., Ltd. | 157300 |
32 |
| Ycchem Co., Ltd. | 66 |
30 |
| BASF (China) Co., Ltd. | 886 |
27 |
| Rhodia Operations | 1499 |
26 |
| FUJIFILM Corporation | 30479 |
25 |
| Other owners | 840 |