- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/20058 - Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
Patent holdings for IPC class G01N 23/20058
Total number of patents in this class: 75
10-year publication summary
|
1
|
1
|
7
|
3
|
13
|
8
|
8
|
13
|
13
|
7
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FEI Company | 944 |
9 |
| LG Chem, Ltd. | 17638 |
3 |
| The Regents of the University of California | 19929 |
3 |
| Bruker Nano GmbH | 65 |
3 |
| Fyzikalni Ustav AV CR, V.v.i. | 38 |
3 |
| Oxford Instruments NanoTechnology Tools Limited | 159 |
3 |
| Riken | 1687 |
3 |
| Tescan Group, A.S. | 32 |
3 |
| Samsung Electronics Co., Ltd. | 146346 |
2 |
| International Business Machines Corporation | 61257 |
2 |
| Commissariat à l'énergie atomique et aux energies alternatives | 10912 |
2 |
| JEOL Ltd. | 581 |
2 |
| Rigaku Corporation | 436 |
2 |
| Ivworks Co., Ltd. | 25 |
2 |
| Merck Patent GmbH | 5823 |
1 |
| Hitachi High-Technologies Corporation | 2004 |
1 |
| Semiconductor Energy Laboratory Co., Ltd. | 11416 |
1 |
| Mitsubishi Electric Corporation | 46127 |
1 |
| ASML Netherlands B.V. | 7392 |
1 |
| California Institute of Technology | 3972 |
1 |
| Other owners | 27 |