- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2055 - Analysing diffraction patterns
Patent holdings for IPC class G01N 23/2055
Total number of patents in this class: 203
10-year publication summary
|
2
|
10
|
10
|
29
|
22
|
22
|
27
|
36
|
19
|
11
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Rigaku Corporation | 428 |
22 |
| The Regents of the University of California | 19839 |
7 |
| FEI Company | 938 |
4 |
| Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | 2874 |
4 |
| Oxford Instruments NanoTechnology Tools Limited | 159 |
4 |
| KLA Corporation | 1516 |
4 |
| Bruker Technologies Ltd. | 87 |
4 |
| LG Energy Solution, Ltd. | 14524 |
4 |
| ASML Netherlands B.V. | 7313 |
3 |
| California Institute of Technology | 3969 |
3 |
| Sigray, Inc. | 77 |
3 |
| Malvern PANalytical B.V. | 131 |
3 |
| Bruker AXS, LLC | 23 |
3 |
| Kioxia Corporation | 10282 |
3 |
| Nova Ltd. | 168 |
3 |
| Semiconductor Energy Laboratory Co., Ltd. | 11371 |
2 |
| Sumitomo Chemical Company, Limited | 9018 |
2 |
| Commissariat à l'énergie atomique et aux energies alternatives | 10879 |
2 |
| Tsinghua University | 5842 |
2 |
| Toray Industries, Inc. | 6906 |
2 |
| Other owners | 119 |