- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2055 - Analysing diffraction patterns
Patent holdings for IPC class G01N 23/2055
Total number of patents in this class: 191
10-year publication summary
2
|
10
|
10
|
29
|
22
|
22
|
27
|
33
|
18
|
2
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Rigaku Corporation | 414 |
21 |
The Regents of the University of California | 19479 |
7 |
Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | 2906 |
4 |
Oxford Instruments NanoTechnology Tools Limited | 155 |
4 |
KLA Corporation | 1393 |
4 |
Bruker Technologies Ltd. | 91 |
4 |
ASML Netherlands B.V. | 7120 |
3 |
California Institute of Technology | 3925 |
3 |
FEI Company | 891 |
3 |
Sigray, Inc. | 72 |
3 |
Malvern PANalytical B.V. | 127 |
3 |
Bruker AXS, LLC | 16 |
3 |
Kioxia Corporation | 10112 |
3 |
LG Energy Solution, Ltd. | 12747 |
3 |
Nova Ltd. | 159 |
3 |
Semiconductor Energy Laboratory Co., Ltd. | 11042 |
2 |
Sumitomo Chemical Company, Limited | 8966 |
2 |
Commissariat à l'énergie atomique et aux energies alternatives | 10667 |
2 |
Tsinghua University | 5686 |
2 |
Toray Industries, Inc. | 6843 |
2 |
Other owners | 110 |