- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portionPreparation thereof
Patent holdings for IPC class G03F 1/32
Total number of patents in this class: 374
10-year publication summary
|
27
|
48
|
37
|
36
|
32
|
52
|
28
|
27
|
10
|
2
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Hoya Corporation | 2690 |
136 |
| Shin-Etsu Chemical Co., Ltd. | 6134 |
50 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48760 |
22 |
| Luminamask Co., Ltd. | 29 |
16 |
| Agc, Inc. | 5626 |
14 |
| Boe Technology Group Co., Ltd. | 44549 |
12 |
| Dai Nippon Printing Co., Ltd. | 4263 |
11 |
| Samsung Display Co., Ltd. | 39012 |
10 |
| Toppan Photomask Co., Ltd. | 33 |
8 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8470 |
7 |
| Samsung Electronics Co., Ltd. | 158842 |
5 |
| Hoya Electronics Singapore Pte. Ltd. | 10 |
5 |
| Nikon Corporation | 7231 |
4 |
| ASML Netherlands B.V. | 8005 |
4 |
| Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | 3755 |
4 |
| S&S Tech Co., Ltd. | 33 |
4 |
| Kioxia Corporation | 10948 |
4 |
| Tekscend Photomask Corp. | 35 |
4 |
| Beijing BOE Display Technology Co., Ltd. | 3014 |
3 |
| Toppan Printing Co., Ltd. | 2080 |
3 |
| Other owners | 48 |