- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/213 - Exposing with the same light pattern different positions of the same surface at the same time
Patent holdings for IPC class G03F 7/213
Total number of patents in this class: 26
10-year publication summary
1
|
1
|
5
|
6
|
4
|
2
|
1
|
2
|
2
|
0
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7418 |
3 |
Nikon Corporation | 7200 |
2 |
Cymer, LLC | 387 |
2 |
EV Group E. Thallner GmbH | 406 |
2 |
Samsung Display Co., Ltd. | 35017 |
1 |
Applied Materials, Inc. | 18792 |
1 |
Huawei Technologies Co., Ltd. | 113340 |
1 |
The Board of Trustees of the Leland Stanford Junior University | 6441 |
1 |
Board of Regents, The University of Texas System | 5828 |
1 |
The Arizona Board of Regents on Behalf of the University of Arizona | 2172 |
1 |
Danmarks Tekniske Universitet | 971 |
1 |
Ecole Polytechnique Federale de Lausanne (epfl) | 1543 |
1 |
IMS Nanofabrication GmbH | 59 |
1 |
National University of Singapore | 2458 |
1 |
Nova Measuring Instruments Ltd. | 67 |
1 |
Ushio Denki Kabushiki Kaisha | 1187 |
1 |
Xeikon Prepress NV | 28 |
1 |
TERA-print, LLC | 10 |
1 |
PlayNitride Display Co., Ltd. | 316 |
1 |
Onto Innovation Inc. | 358 |
1 |
Other owners | 1 |