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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/213 - Exposing with the same light pattern different positions of the same surface at the same time

Patent holdings for IPC class G03F 7/213

Total number of patents in this class: 26

10-year publication summary

1
1
5
6
4
2
1
2
2
0
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
ASML Netherlands B.V.
7418
3
Nikon Corporation
7200
2
Cymer, LLC
387
2
EV Group E. Thallner GmbH
406
2
Samsung Display Co., Ltd.
35017
1
Applied Materials, Inc.
18792
1
Huawei Technologies Co., Ltd.
113340
1
The Board of Trustees of the Leland Stanford Junior University
6441
1
Board of Regents, The University of Texas System
5828
1
The Arizona Board of Regents on Behalf of the University of Arizona
2172
1
Danmarks Tekniske Universitet
971
1
Ecole Polytechnique Federale de Lausanne (epfl)
1543
1
IMS Nanofabrication GmbH
59
1
National University of Singapore
2458
1
Nova Measuring Instruments Ltd.
67
1
Ushio Denki Kabushiki Kaisha
1187
1
Xeikon Prepress NV
28
1
TERA-print, LLC
10
1
PlayNitride Display Co., Ltd.
316
1
Onto Innovation Inc.
358
1
Other owners 1

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