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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/26 - Processing photosensitive materialsApparatus therefor

Patent holdings for IPC class G03F 7/26

Total number of patents in this class: 1438

10-year publication summary

63
101
100
127
88
84
59
49
38
42
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
FUJIFILM Corporation
29752
128
Nissan Chemical Corporation
2093
79
JSR Corporation
2535
73
Taiwan Semiconductor Manufacturing Company, Ltd.
45023
70
Tokyo Electron Limited
13063
58
Shin-Etsu Chemical Co., Ltd.
5745
58
Nissan Chemical Industries, Ltd.
1699
56
Tokyo Ohka Kogyo Co., Ltd.
1549
52
Mitsubishi Gas Chemical Company, Inc.
3494
50
Micron Technology, Inc.
26395
32
MacDermid Graphics Solutions, LLC
119
27
Applied Materials, Inc.
19119
23
International Business Machines Corporation
61694
22
Eastman Kodak Company
2807
22
Samsung Electronics Co., Ltd.
148649
18
Samsung SDI Co., Ltd.
8970
16
Boe Technology Group Co., Ltd.
41695
16
GLOBALFOUNDRIES U.S. Inc.
6415
16
DuPont Electronic Materials International, LLC
430
15
Cheil Industries Inc.
844
14
Other owners 593

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