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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/26 - Processing photosensitive materialsApparatus therefor

Patent holdings for IPC class G03F 7/26

Total number of patents in this class: 1447

10-year publication summary

102
101
128
88
84
61
54
39
46
10
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
FUJIFILM Corporation
30296
125
Nissan Chemical Corporation
2177
83
JSR Corporation
2525
75
Taiwan Semiconductor Manufacturing Company, Ltd.
47602
72
Shin-Etsu Chemical Co., Ltd.
5976
59
Tokyo Electron Limited
13577
58
Nissan Chemical Industries, Ltd.
1663
56
Tokyo Ohka Kogyo Co., Ltd.
1545
52
Mitsubishi Gas Chemical Company, Inc.
3596
50
Micron Technology, Inc.
27348
31
MacDermid Graphics Solutions, LLC
117
28
Applied Materials, Inc.
20112
25
International Business Machines Corporation
62295
22
Eastman Kodak Company
2668
22
Samsung Electronics Co., Ltd.
154751
18
Samsung SDI Co., Ltd.
10047
17
Boe Technology Group Co., Ltd.
43166
16
GLOBALFOUNDRIES U.S. Inc.
6397
16
DuPont Electronic Materials International, LLC
423
15
Cheil Industries Inc.
819
14
Other owners 593

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