- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
Patent holdings for IPC class G03F 7/38
Total number of patents in this class: 1393
10-year publication summary
|
154
|
149
|
150
|
109
|
87
|
108
|
82
|
67
|
75
|
20
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 5933 |
186 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47211 |
128 |
| FUJIFILM Corporation | 30210 |
127 |
| Sumitomo Chemical Company, Limited | 9044 |
115 |
| Tokyo Electron Limited | 13513 |
85 |
| JSR Corporation | 2540 |
66 |
| Tokyo Ohka Kogyo Co., Ltd. | 1544 |
63 |
| Applied Materials, Inc. | 19999 |
50 |
| Merck Patent GmbH | 5662 |
28 |
| DuPont Electronic Materials International, LLC | 425 |
27 |
| Samsung Electronics Co., Ltd. | 153573 |
26 |
| Nissan Chemical Industries, Ltd. | 1666 |
24 |
| Lam Research Corporation | 5520 |
22 |
| International Business Machines Corporation | 62182 |
18 |
| Inpria Corporation | 139 |
17 |
| Carbon, Inc. | 411 |
17 |
| Central Glass Company, Limited | 1284 |
15 |
| Nissan Chemical Corporation | 2155 |
15 |
| Osaka University | 3309 |
11 |
| Mitsubishi Gas Chemical Company, Inc. | 3586 |
10 |
| Other owners | 343 |