- All sections
- G - Physics
- G21K - Techniques for handling particles or ionising radiation not otherwise provided forirradiation devicesgamma ray or x-ray microscopes
- G21K 7/00 - Gamma ray or X-ray microscopes
Patent holdings for IPC class G21K 7/00
Total number of patents in this class: 315
10-year publication summary
|
17
|
15
|
10
|
13
|
9
|
11
|
11
|
8
|
7
|
2
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Hitachi High-Tech Corporation | 5578 |
48 |
| FEI Company | 1021 |
24 |
| Carl Zeiss X-Ray Microscopy, Inc. | 114 |
21 |
| California Institute of Technology | 4015 |
14 |
| Shenzhen Xpectvision Technology Co., Ltd. | 377 |
9 |
| ASML Netherlands B.V. | 7673 |
8 |
| Carl Zeiss SMT GmbH | 3169 |
7 |
| Canon Anelva Corporation | 688 |
6 |
| Applied Materials Israel, Ltd. | 636 |
5 |
| Bruker Nano, Inc. | 356 |
5 |
| ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | 155 |
5 |
| JEOL Ltd. | 614 |
5 |
| Lawrence Livermore National Security, LLC | 1955 |
4 |
| National Institute of Advanced Industrial Science and Technology | 3796 |
4 |
| Hologic, Inc. | 1158 |
4 |
| KLA-Tencor Technologies Corporation | 146 |
4 |
| Osaka University | 3355 |
4 |
| Canon Kabushiki Kaisha | 7203 |
4 |
| Hermes Microvision Incorporated B.V. | 123 |
4 |
| Hitachi, Ltd. | 15819 |
3 |
| Other owners | 127 |