- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/203 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using physical deposition, e.g. vacuum deposition, sputtering
Patent holdings for IPC class H01L 21/203
Total number of patents in this class: 598
10-year publication summary
|
43
|
28
|
40
|
31
|
36
|
20
|
16
|
15
|
14
|
19
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Applied Materials, Inc. | 18861 |
95 |
| Showa Denko K.K. | 2204 |
17 |
| Canon Anelva Corporation | 683 |
16 |
| ULVAC, Inc. | 1378 |
14 |
| Japan Display Inc. | 7011 |
13 |
| Sumitomo Electric Industries, Ltd. | 15593 |
12 |
| Semiconductor Energy Laboratory Co., Ltd. | 11475 |
12 |
| Idemitsu Kosan Co., Ltd. | 4223 |
12 |
| Tosoh Corporation | 1314 |
10 |
| Intel Corporation | 47143 |
9 |
| Honeywell International Inc. | 13550 |
7 |
| Tokyo Electron Limited | 12877 |
7 |
| Lam Research Corporation | 5309 |
7 |
| LG Innotek Co., Ltd. | 7722 |
5 |
| NGK Insulators, Ltd. | 5016 |
5 |
| National Institute for Materials Science | 1105 |
5 |
| National University Corporation Nagoya University | 847 |
5 |
| The Research Foundation for The State University of New York | 1632 |
5 |
| Fujitsu Limited | 18387 |
4 |
| FUJIFILM Corporation | 29543 |
4 |
| Other owners | 334 |