- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer
Patent holdings for IPC class H01L 21/225
Total number of patents in this class: 1554
10-year publication summary
|
230
|
206
|
179
|
158
|
111
|
76
|
64
|
74
|
57
|
17
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48248 |
168 |
| International Business Machines Corporation | 62621 |
125 |
| Texas Instruments Incorporated | 19663 |
61 |
| Fuji Electric Co., Ltd. | 5469 |
53 |
| Infineon Technologies AG | 8400 |
49 |
| United Microelectronics Corp. | 4492 |
35 |
| Applied Materials, Inc. | 20363 |
34 |
| Infineon Technologies Austria AG | 2328 |
31 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1735 |
31 |
| Hitachi Chemical Company, Ltd. | 2245 |
30 |
| GLOBALFOUNDRIES U.S. Inc. | 6391 |
28 |
| Samsung Electronics Co., Ltd. | 157557 |
25 |
| Intel Corporation | 47102 |
25 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1031 |
24 |
| Tokyo Ohka Kogyo Co., Ltd. | 1560 |
23 |
| Institute of Microelectronics, Chinese Academy of Sciences | 1459 |
20 |
| Micron Technology, Inc. | 27626 |
19 |
| Screen Holdings Co., Ltd. | 3148 |
19 |
| Mitsubishi Electric Corporation | 47971 |
18 |
| Toray Industries, Inc. | 7096 |
17 |
| Other owners | 719 |