• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer

Patent holdings for IPC class H01L 21/225

Total number of patents in this class: 1554

10-year publication summary

230
206
179
158
111
76
64
74
57
17
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Taiwan Semiconductor Manufacturing Company, Ltd.
48248
168
International Business Machines Corporation
62621
125
Texas Instruments Incorporated
19663
61
Fuji Electric Co., Ltd.
5469
53
Infineon Technologies AG
8400
49
United Microelectronics Corp.
4492
35
Applied Materials, Inc.
20363
34
Infineon Technologies Austria AG
2328
31
Semiconductor Manufacturing International (Shanghai) Corporation
1735
31
Hitachi Chemical Company, Ltd.
2245
30
GLOBALFOUNDRIES U.S. Inc.
6391
28
Samsung Electronics Co., Ltd.
157557
25
Intel Corporation
47102
25
Semiconductor Manufacturing International (Beijing) Corporation
1031
24
Tokyo Ohka Kogyo Co., Ltd.
1560
23
Institute of Microelectronics, Chinese Academy of Sciences
1459
20
Micron Technology, Inc.
27626
19
Screen Holdings Co., Ltd.
3148
19
Mitsubishi Electric Corporation
47971
18
Toray Industries, Inc.
7096
17
Other owners 719