- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/383 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions using diffusion into, or out of, a solid from or into a gaseous phase
Patent holdings for IPC class H01L 21/383
Total number of patents in this class: 62
10-year publication summary
|
4
|
7
|
5
|
5
|
10
|
3
|
3
|
5
|
4
|
1
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Semiconductor Energy Laboratory Co., Ltd. | 11873 |
17 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48629 |
12 |
| Boe Technology Group Co., Ltd. | 44484 |
5 |
| Magnolia White Corporation | 5591 |
4 |
| Intel Corporation | 47162 |
2 |
| Applied Materials, Inc. | 20514 |
2 |
| Hefei Xinsheng Optoelectronics Technology Co., Ltd. | 2650 |
2 |
| Toyota Motor Corporation | 35992 |
1 |
| Sharp Corporation | 10847 |
1 |
| Infineon Technologies AG | 8410 |
1 |
| Tokyo Electron Limited | 13884 |
1 |
| The Board of Trustees of the Leland Stanford Junior University | 6697 |
1 |
| Lam Research Corporation | 5676 |
1 |
| National Taiwan University | 1328 |
1 |
| Bowling Green State University | 75 |
1 |
| Fudan University | 769 |
1 |
| National Chiao Tung University | 507 |
1 |
| OmniVision Technologies, Inc. | 1603 |
1 |
| Beijing Naura Microelectronics Equipment Co., Ltd. | 751 |
1 |
| Sharp Kabushiki Kaisha | 18495 |
1 |
| Other owners | 5 |