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  • All sections
  • C - Chemistrymetallurgy
  • C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
  • C23F 4/00 - Processes for removing metallic material from surfaces, not provided for in group or

Patent holdings for IPC class C23F 4/00

Total number of patents in this class: 343

10-year publication summary

43
29
38
40
24
20
17
12
5
11
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Tokyo Electron Limited
12795
38
Lam Research Corporation
5282
19
Applied Materials, Inc.
18759
18
Hitachi High-Tech Corporation
5343
10
Hon Hai Precision Industry Co., Ltd.
4029
8
Tsinghua University
5938
8
Canon Anelva Corporation
685
8
Adeia Semiconductor Solutions LLC
291
8
Varian Semiconductor Equipment Associates, Inc.
1231
6
Techinsights Inc.
93
6
Samsung Display Co., Ltd.
34984
5
FUJIFILM Corporation
29458
5
Japan Aviation Electronics Industry, Limited
1721
5
Toyo Kohan Co., Ltd.
419
5
Taiwan Semiconductor Manufacturing Company, Ltd.
43015
4
Seagate Technology LLC
3970
4
Boe Technology Group Co., Ltd.
41346
4
Central Glass Company, Limited
1264
4
Tohoku University
2790
4
Samsung Electronics Co., Ltd.
147003
3
Other owners 171

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