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  • C - Chemistrymetallurgy
  • C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
  • C23F 4/00 - Processes for removing metallic material from surfaces, not provided for in group or

Patent holdings for IPC class C23F 4/00

Total number of patents in this class: 345

10-year publication summary

29
38
40
24
20
17
13
5
13
0
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Tokyo Electron Limited
13185
38
Lam Research Corporation
5387
20
Applied Materials, Inc.
19361
19
Hitachi High-Tech Corporation
5496
10
Hon Hai Precision Industry Co., Ltd.
4014
8
Tsinghua University
6042
8
Canon Anelva Corporation
690
8
Adeia Semiconductor Solutions LLC
292
8
Varian Semiconductor Equipment Associates, Inc.
1222
6
Techinsights Inc.
95
6
Samsung Display Co., Ltd.
36582
5
FUJIFILM Corporation
29871
5
Central Glass Company, Limited
1271
5
Japan Aviation Electronics Industry, Limited
1785
5
Toyo Kohan Co., Ltd.
422
5
Taiwan Semiconductor Manufacturing Company, Ltd.
46267
4
Seagate Technology LLC
3979
4
Boe Technology Group Co., Ltd.
41901
4
Tohoku University
2852
4
Samsung Electronics Co., Ltd.
149582
3
Other owners 170

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