- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/38 - Masks having auxiliary features, e.g. special coatings or marks for alignment or testingPreparation thereof
Patent holdings for IPC class G03F 1/38
Total number of patents in this class: 534
10-year publication summary
|
42
|
47
|
52
|
42
|
51
|
33
|
33
|
30
|
26
|
6
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
65 |
| Boe Technology Group Co., Ltd. | 44029 |
41 |
| Hoya Corporation | 2721 |
33 |
| Apple Inc. | 58742 |
20 |
| ASML Netherlands B.V. | 7925 |
20 |
| Samsung Electronics Co., Ltd. | 157719 |
17 |
| Shin-Etsu Chemical Co., Ltd. | 6096 |
15 |
| Applied Materials, Inc. | 20375 |
14 |
| Samsung Display Co., Ltd. | 38627 |
12 |
| United Microelectronics Corp. | 4492 |
12 |
| SK Hynix Inc. | 12486 |
11 |
| Carl Zeiss SMT GmbH | 3332 |
9 |
| Chengdu BOE Optoelectronics Technology Co., Ltd. | 7676 |
9 |
| Kioxia Corporation | 10815 |
9 |
| LG Chem, Ltd. | 17921 |
8 |
| International Business Machines Corporation | 62634 |
8 |
| Micron Technology, Inc. | 27657 |
8 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8471 |
7 |
| Wuhan China Star Optoelectronics Technology Co., Ltd. | 4316 |
7 |
| Canon Inc. | 43817 |
6 |
| Other owners | 203 |