- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/42 - Alignment or registration features, e.g. alignment marks on the mask substrates
Patent holdings for IPC class G03F 1/42
Total number of patents in this class: 347
10-year publication summary
|
16
|
26
|
38
|
37
|
34
|
31
|
35
|
23
|
15
|
12
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48438 |
67 |
| ASML Netherlands B.V. | 7939 |
26 |
| Boe Technology Group Co., Ltd. | 44074 |
23 |
| Hoya Corporation | 2717 |
15 |
| Kioxia Corporation | 10823 |
15 |
| Samsung Electronics Co., Ltd. | 157946 |
14 |
| Changxin Memory Technologies, Inc. | 4933 |
14 |
| Samsung Display Co., Ltd. | 38676 |
11 |
| Canon Inc. | 43869 |
8 |
| Applied Materials, Inc. | 20406 |
7 |
| Nikon Corporation | 7226 |
7 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8471 |
6 |
| Carl Zeiss SMT GmbH | 3339 |
6 |
| Nanya Technology Corporation | 2913 |
5 |
| Ordos Yuansheng Optoelectronics Co., Ltd. | 1296 |
5 |
| Tokyo Electron Limited | 13824 |
4 |
| Hefei Xinsheng Optoelectronics Technology Co., Ltd. | 2644 |
4 |
| Intel Corporation | 47122 |
3 |
| Texas Instruments Incorporated | 19653 |
3 |
| SK Hynix Inc. | 12506 |
3 |
| Other owners | 101 |