- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/52 - Reflectors
Patent holdings for IPC class G03F 1/52
Total number of patents in this class: 135
10-year publication summary
|
9
|
3
|
14
|
16
|
30
|
16
|
13
|
9
|
12
|
4
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 43400 |
32 |
| Applied Materials, Inc. | 18892 |
27 |
| Agc, Inc. | 4922 |
23 |
| Samsung Electronics Co., Ltd. | 147622 |
7 |
| Hoya Corporation | 2754 |
6 |
| Carl Zeiss SMT GmbH | 3027 |
5 |
| Shin-Etsu Chemical Co., Ltd. | 5687 |
3 |
| KLA Corporation | 1605 |
3 |
| SK Hynix Inc. | 11484 |
2 |
| HKC Corporation Limited | 3281 |
2 |
| Chongqing HKC Optoelectronics Technology Co., ltd. | 1336 |
2 |
| WI-A Corporation | 17 |
2 |
| Kioxia Corporation | 10441 |
2 |
| Tekscend Photomask Corp. | 31 |
2 |
| Samsung Display Co., Ltd. | 35269 |
1 |
| LG Chem, Ltd. | 17656 |
1 |
| Nikon Corporation | 7265 |
1 |
| United Microelectronics Corp. | 4249 |
1 |
| Boe Technology Group Co., Ltd. | 41547 |
1 |
| Advanced Mask Technology Center GmbH & Co. KG | 12 |
1 |
| Other owners | 11 |