- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/62 - Pellicles or pellicle assemblies, e.g. having membrane on support framePreparation thereof
Patent holdings for IPC class G03F 1/62
Total number of patents in this class: 648
10-year publication summary
|
40
|
43
|
48
|
38
|
61
|
44
|
53
|
70
|
52
|
65
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7545 |
162 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 45023 |
91 |
| Mitsui Chemicals, Inc. | 3233 |
54 |
| Shin-Etsu Chemical Co., Ltd. | 5745 |
48 |
| Samsung Electronics Co., Ltd. | 148649 |
38 |
| Fine Semitech Corp. | 28 |
13 |
| ASML Holding N.V. | 499 |
12 |
| IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1454 |
11 |
| IMEC VZW | 1679 |
10 |
| Korea Electronics Technology Institute | 1668 |
10 |
| NGK Insulators, Ltd. | 5129 |
9 |
| Lintec of America, Inc. | 160 |
9 |
| Photronics, Inc. | 43 |
9 |
| Applied Materials, Inc. | 19119 |
8 |
| Research & Business Foundation Sungkyunkwan University | 2011 |
8 |
| Carl Zeiss SMT GmbH | 3061 |
7 |
| Air Water Inc. | 148 |
7 |
| Lintec Corporation | 1996 |
7 |
| International Business Machines Corporation | 61694 |
6 |
| GrapheneLab.Co.,Ltd. | 13 |
6 |
| Other owners | 123 |