- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/62 - Pellicles or pellicle assemblies, e.g. having membrane on support framePreparation thereof
Patent holdings for IPC class G03F 1/62
Total number of patents in this class: 704
10-year publication summary
|
52
|
49
|
42
|
66
|
48
|
56
|
74
|
53
|
72
|
51
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 8060 |
170 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 49677 |
103 |
| Mitsui Chemicals, Inc. | 3290 |
60 |
| Shin-Etsu Chemical Co., Ltd. | 6186 |
53 |
| Samsung Electronics Co., Ltd. | 159978 |
38 |
| Sumitomo Chemical Company, Limited | 8992 |
15 |
| Fine Semitech Corp. | 31 |
13 |
| ASML Holding N.V. | 486 |
12 |
| IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1735 |
12 |
| Lintec of America, Inc. | 162 |
12 |
| IMEC VZW | 1846 |
10 |
| Korea Electronics Technology Institute | 1815 |
10 |
| NGK Insulators, Ltd. | 5162 |
9 |
| Lintec Corporation | 2042 |
9 |
| Photronics, Inc. | 45 |
9 |
| Applied Materials, Inc. | 20694 |
8 |
| Research & Business Foundation Sungkyunkwan University | 2213 |
8 |
| Carl Zeiss SMT GmbH | 3386 |
7 |
| International Business Machines Corporation | 62897 |
6 |
| Air Water Inc. | 163 |
6 |
| Other owners | 134 |