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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/66 - Containers specially adapted for masks, mask blanks or pelliclesPreparation thereof

Patent holdings for IPC class G03F 1/66

Total number of patents in this class: 266

10-year publication summary

11
10
16
14
22
34
28
43
30
40
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Entegris, Inc.
1908
62
Taiwan Semiconductor Manufacturing Company, Ltd.
46161
46
Gudeng Precision Industrial Co., Ltd.
159
30
ASML Netherlands B.V.
7585
18
Brooks Automation (Germany) GmbH
95
10
Samsung Electronics Co., Ltd.
149087
6
Shin-Etsu Chemical Co., Ltd.
5784
6
Mitsui Chemicals, Inc.
3230
6
Applied Materials, Inc.
19248
5
Nikon Corporation
7303
5
Murata Machinery, Ltd.
1527
5
ASML Holding N.V.
498
4
Gudeng Equipment Co., Ltd.
23
4
Boe Technology Group Co., Ltd.
41781
3
Fine Semitech Corp.
28
3
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
1459
3
Ordos Yuansheng Optoelectronics Co., Ltd.
1279
3
Changxin Memory Technologies, Inc.
4928
3
FUJIFILM Corporation
29817
2
Tokyo Electron Limited
13136
2
Other owners 40

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