- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/86 - Inspecting by charged particle beam [CPB]
Patent holdings for IPC class G03F 1/86
Total number of patents in this class: 90
10-year publication summary
|
5
|
5
|
8
|
13
|
5
|
11
|
12
|
3
|
6
|
6
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 3370 |
20 |
| ASML Netherlands B.V. | 8019 |
13 |
| KLA-Tencor Corporation | 2517 |
8 |
| Samsung Electronics Co., Ltd. | 159029 |
7 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48861 |
6 |
| FUJIFILM Corporation | 30689 |
3 |
| Lam Research Corporation | 5705 |
3 |
| NuFlare Technology, Inc. | 928 |
3 |
| KLA Corporation | 1879 |
3 |
| Hitachi High-Technologies Corporation | 1986 |
2 |
| Applied Materials Israel, Ltd. | 688 |
2 |
| SK Hynix Inc. | 12667 |
2 |
| Hoya Corporation | 2688 |
2 |
| Multibeam Corporation | 30 |
2 |
| Hitachi High-Tech Corporation | 5969 |
2 |
| Nikon Corporation | 7233 |
1 |
| Carl Zeiss SMS GmbH | 45 |
1 |
| Carl Zeiss SMS Ltd. | 56 |
1 |
| Dongfang Jingyuan Electron Limited | 45 |
1 |
| Exogenesis Corporation | 68 |
1 |
| Other owners | 7 |