- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/22 - Exposing sequentially with the same light pattern different positions of the same surface
Patent holdings for IPC class G03F 7/22
Total number of patents in this class: 95
10-year publication summary
7
|
3
|
10
|
9
|
12
|
7
|
2
|
6
|
4
|
2
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Nikon Corporation | 7298 |
12 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 43854 |
9 |
Boe Technology Group Co., Ltd. | 41698 |
8 |
Hefei Xinsheng Optoelectronics Technology Co., Ltd. | 2571 |
5 |
V Technology Co., Ltd. | 380 |
5 |
ASML Netherlands B.V. | 7490 |
4 |
FUJIFILM Corporation | 29702 |
3 |
Samsung Electronics Co., Ltd. | 147983 |
2 |
3m Innovative Properties Company | 17770 |
2 |
Samsung Display Co., Ltd. | 35468 |
2 |
Micron Technology, Inc. | 26255 |
2 |
Hefei BOE Optoelectronics Technology Co., Ltd. | 1372 |
2 |
Tokyo Ohka Kogyo Co., Ltd. | 1552 |
2 |
Ushio Denki Kabushiki Kaisha | 1196 |
2 |
LG Display Co., Ltd. | 13836 |
1 |
Canon Inc. | 40555 |
1 |
Panasonic Corporation | 20030 |
1 |
Texas Instruments Incorporated | 19456 |
1 |
Applied Materials, Inc. | 18968 |
1 |
Panasonic Intellectual Property Corporation of America | 6862 |
1 |
Other owners | 29 |