- All sections
- H - Electricity
- H05G - X-ray technique
- H05G 2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Patent holdings for IPC class H05G 2/00
Total number of patents in this class: 2030
10-year publication summary
|
207
|
161
|
149
|
145
|
169
|
133
|
125
|
120
|
122
|
9
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7171 |
518 |
| Gigaphoton Inc. | 1187 |
451 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40608 |
187 |
| Ushio Denki Kabushiki Kaisha | 1141 |
85 |
| TRUMPF Lasersystems for Semiconductor Manufacturing GmbH | 89 |
45 |
| KLA-Tencor Corporation | 2550 |
44 |
| Samsung Electronics Co., Ltd. | 139001 |
37 |
| Carl Zeiss SMT GmbH | 2815 |
37 |
| KLA Corporation | 1402 |
28 |
| Imagine Scientific, Inc. | 24 |
15 |
| Koninklijke Philips Electronics N.V. | 10844 |
14 |
| Lawrence Livermore National Security, LLC | 1882 |
14 |
| Excillum AB | 67 |
14 |
| Philips Intellectual Property & Standards GmbH | 2112 |
14 |
| Hamamatsu Photonics K.K. | 4304 |
12 |
| IHI Corporation | 3359 |
12 |
| Eth Zurich | 1253 |
11 |
| Cymer, Inc. | 95 |
9 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1773 |
9 |
| Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | 6135 |
9 |
| Other owners | 465 |