- All sections
- H - Electricity
- H10B - Electronic memory devices
- H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
Patent holdings for IPC class H10B 43/27
Total number of patents in this class: 2636
10-year publication summary
0
|
0
|
0
|
3
|
18
|
277
|
673
|
566
|
1031
|
82
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Samsung Electronics Co., Ltd. | 139001 |
557 |
Kioxia Corporation | 10119 |
406 |
Yangtze Memory Technologies Co., Ltd. | 2335 |
319 |
SK Hynix Inc. | 10800 |
316 |
Micron Technology, Inc. | 25824 |
302 |
Sandisk Technologies Inc. | 4946 |
211 |
Lodestar Licensing Group LLC | 891 |
80 |
Macronix International Co., Ltd. | 2556 |
55 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 40608 |
51 |
Applied Materials, Inc. | 17745 |
44 |
JPMorgan Chase Bank, N.A., AS The Agent | 2357 |
28 |
Sandisk Technologies LLC | 1455 |
24 |
Sunrise Memory Corporation | 206 |
24 |
Semiconductor Energy Laboratory Co., Ltd. | 11101 |
23 |
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1269 |
19 |
Lam Research Corporation | 5001 |
18 |
Monolithic 3D Inc. | 299 |
15 |
Institute of Microelectronics, Chinese Academy of Sciences | 1344 |
14 |
Intel NDTM US LLC | 425 |
13 |
Tokyo Electron Limited | 12115 |
12 |
Other owners | 105 |