- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2206 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
Patent holdings for IPC class G01N 23/2206
Total number of patents in this class: 135
10-year publication summary
|
5
|
6
|
12
|
11
|
14
|
15
|
28
|
18
|
14
|
5
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Canon Anelva Corporation | 687 |
11 |
| FEI Company | 1023 |
10 |
| ASML Netherlands B.V. | 7680 |
6 |
| HORIBA, Ltd. | 843 |
5 |
| Applied Materials Israel, Ltd. | 637 |
4 |
| Carl Zeiss SMT GmbH | 3172 |
3 |
| Bruker Nano GmbH | 67 |
3 |
| Orexplore AB | 11 |
3 |
| Shanghai United Imaging Healthcare Co., Ltd. | 2012 |
3 |
| Hitachi High-Tech Corporation | 5593 |
3 |
| Enersoft Inc. | 47 |
2 |
| National Institute for Materials Science | 1091 |
2 |
| Riken | 1699 |
2 |
| Topcon Corporation | 1144 |
2 |
| Shenzhen Xpectvision Technology Co., Ltd. | 377 |
2 |
| Advanced Manufacturing LLC | 4 |
2 |
| Global Physical Asset Management, Inc. | 5 |
2 |
| KLA Corporation | 1762 |
2 |
| Veracio Ltd. | 68 |
2 |
| Hitachi High-Tech Analysis Corporation | 286 |
2 |
| Other owners | 64 |