- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/76 - Patterning of masks by imaging
Patent holdings for IPC class G03F 1/76
Total number of patents in this class: 205
10-year publication summary
|
20
|
21
|
20
|
11
|
12
|
18
|
14
|
13
|
17
|
8
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 49324 |
44 |
| Shin-Etsu Chemical Co., Ltd. | 6157 |
13 |
| Applied Materials, Inc. | 20625 |
10 |
| Samsung Electronics Co., Ltd. | 159473 |
8 |
| Lam Research Corporation | 5723 |
8 |
| Boe Technology Group Co., Ltd. | 44746 |
8 |
| FUJIFILM Corporation | 30808 |
7 |
| Kioxia Corporation | 11025 |
7 |
| Hoya Corporation | 2400 |
5 |
| Google LLC | 44900 |
5 |
| Texas Instruments Incorporated | 19638 |
4 |
| ASML Netherlands B.V. | 8045 |
4 |
| Mycronic AB | 170 |
4 |
| United Microelectronics Corp. | 4534 |
3 |
| Synopsys, Inc. | 2630 |
3 |
| Tsinghua University | 6260 |
3 |
| Hefei BOE Optoelectronics Technology Co., Ltd. | 1401 |
3 |
| Beijing Vfortune New Energy Power Technology Development Co., Ltd. | 26 |
3 |
| Samsung Display Co., Ltd. | 39229 |
2 |
| LG Chem, Ltd. | 17986 |
2 |
| Other owners | 59 |