- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/76 - Patterning of masks by imaging
Patent holdings for IPC class G03F 1/76
Total number of patents in this class: 185
10-year publication summary
|
26
|
20
|
21
|
20
|
11
|
12
|
18
|
14
|
13
|
3
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40717 |
37 |
| Shin-Etsu Chemical Co., Ltd. | 5460 |
13 |
| Applied Materials, Inc. | 17808 |
8 |
| Boe Technology Group Co., Ltd. | 39086 |
8 |
| FUJIFILM Corporation | 28841 |
7 |
| Lam Research Corporation | 5022 |
7 |
| Kioxia Corporation | 10136 |
7 |
| Google LLC | 40989 |
5 |
| Samsung Electronics Co., Ltd. | 139551 |
4 |
| Texas Instruments Incorporated | 19443 |
4 |
| Hoya Corporation | 2746 |
4 |
| ASML Netherlands B.V. | 7190 |
3 |
| United Microelectronics Corp. | 4121 |
3 |
| Synopsys, Inc. | 2805 |
3 |
| Tsinghua University | 5719 |
3 |
| Hefei BOE Optoelectronics Technology Co., Ltd. | 1343 |
3 |
| Beijing Vfortune New Energy Power Technology Development Co., Ltd. | 18 |
3 |
| Samsung Display Co., Ltd. | 32942 |
2 |
| LG Chem, Ltd. | 17657 |
2 |
| Canon Inc. | 38296 |
2 |
| Other owners | 57 |