- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/78 - Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam
Patent holdings for IPC class G03F 1/78
Total number of patents in this class: 152
10-year publication summary
|
15
|
18
|
23
|
13
|
13
|
10
|
8
|
16
|
12
|
5
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 43854 |
35 |
| D2s, Inc. | 179 |
26 |
| NuFlare Technology, Inc. | 863 |
12 |
| Samsung Electronics Co., Ltd. | 147983 |
8 |
| Shin-Etsu Chemical Co., Ltd. | 5708 |
6 |
| Hoya Corporation | 2756 |
5 |
| Carl Zeiss SMT GmbH | 3034 |
5 |
| FUJIFILM Corporation | 29702 |
4 |
| Agc, Inc. | 4944 |
4 |
| Kioxia Corporation | 10439 |
4 |
| Texas Instruments Incorporated | 19456 |
3 |
| Applied Materials, Inc. | 18968 |
3 |
| SK Hynix Inc. | 11526 |
3 |
| Lam Research Corporation | 5320 |
3 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8476 |
3 |
| Nippon Control System Corporation | 19 |
3 |
| GenISys GmbH | 4 |
2 |
| The University of Manchester | 453 |
2 |
| International Business Machines Corporation | 61596 |
1 |
| Intel Corporation | 47239 |
1 |
| Other owners | 19 |