- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/78 - Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam
Patent holdings for IPC class G03F 1/78
Total number of patents in this class: 155
10-year publication summary
|
18
|
23
|
13
|
13
|
10
|
8
|
16
|
12
|
6
|
2
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
35 |
| D2s, Inc. | 199 |
26 |
| NuFlare Technology, Inc. | 922 |
12 |
| Samsung Electronics Co., Ltd. | 157719 |
8 |
| Shin-Etsu Chemical Co., Ltd. | 6096 |
8 |
| Hoya Corporation | 2721 |
5 |
| Carl Zeiss SMT GmbH | 3332 |
5 |
| FUJIFILM Corporation | 30514 |
4 |
| Agc, Inc. | 5524 |
4 |
| Kioxia Corporation | 10815 |
4 |
| Texas Instruments Incorporated | 19672 |
3 |
| Applied Materials, Inc. | 20375 |
3 |
| SK Hynix Inc. | 12486 |
3 |
| Lam Research Corporation | 5635 |
3 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8471 |
3 |
| Nippon Control System Corporation | 19 |
3 |
| GenISys GmbH | 4 |
2 |
| The University of Manchester | 454 |
2 |
| International Business Machines Corporation | 62634 |
1 |
| Intel Corporation | 47106 |
1 |
| Other owners | 20 |