- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/20 - ExposureApparatus therefor
Patent holdings for IPC class G03F 7/20
Total number of patents in this class: 21237
10-year publication summary
|
1810
|
1994
|
2154
|
1994
|
1640
|
1515
|
1264
|
901
|
863
|
235
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7745 |
3878 |
| Carl Zeiss SMT GmbH | 3220 |
1745 |
| Nikon Corporation | 7304 |
1095 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47319 |
1079 |
| FUJIFILM Corporation | 30244 |
1019 |
| Shin-Etsu Chemical Co., Ltd. | 5948 |
507 |
| JSR Corporation | 2534 |
447 |
| Applied Materials, Inc. | 20036 |
409 |
| Tokyo Ohka Kogyo Co., Ltd. | 1547 |
382 |
| Canon Inc. | 42303 |
368 |
| Gigaphoton Inc. | 1304 |
348 |
| KLA-Tencor Corporation | 2523 |
348 |
| Samsung Electronics Co., Ltd. | 153845 |
328 |
| ASML Holding N.V. | 487 |
326 |
| Tokyo Electron Limited | 13523 |
323 |
| Nissan Chemical Corporation | 2163 |
201 |
| KLA Corporation | 1790 |
197 |
| Boe Technology Group Co., Ltd. | 42957 |
153 |
| Carl Zeiss SMT AG | 165 |
141 |
| Hoya Corporation | 2738 |
132 |
| Other owners | 7811 |