- All sections
- H - Electricity
- H05H - Plasma technique; production of accelerated electrically- charged particles or of neutrons; production or acceleration of neutral molecular or atomic beams
- H05H 1/00 - Generating plasma; Handling plasma
Patent holdings for IPC class H05H 1/00
Total number of patents in this class: 640
10-year publication summary
|
33
|
24
|
38
|
36
|
39
|
54
|
38
|
24
|
46
|
4
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 12115 |
39 |
| General Fusion Inc. | 73 |
19 |
| Applied Materials, Inc. | 17745 |
16 |
| Lam Research Corporation | 5001 |
14 |
| Fuji Corporation | 3182 |
11 |
| Centre National de La Recherche Scientifique | 10102 |
7 |
| Advanced Energy Industries, Inc. | 443 |
6 |
| Brilliant Light Power, Inc. | 62 |
6 |
| Panasonic Corporation | 20315 |
5 |
| Hamamatsu Photonics K.K. | 4304 |
5 |
| Gigaphoton Inc. | 1187 |
5 |
| MKS Instruments, Inc. | 684 |
5 |
| Ruhr-Universität Bochum | 87 |
5 |
| Sakura Color Products Corporation | 263 |
5 |
| Toshiba Mitsubishi-Electric Industrial Systems Corporation | 988 |
5 |
| Samsung Electronics Co., Ltd. | 139001 |
4 |
| Kyocera Corporation | 13344 |
4 |
| ASML Netherlands B.V. | 7171 |
4 |
| Shimadzu Corporation | 6019 |
4 |
| Beijing NMC Co., Ltd. | 113 |
4 |
| Other owners | 467 |