- All sections
- H - Electricity
- H05H - Plasma technique production of accelerated electrically-charged particles or of neutronsproduction or acceleration of neutral molecular or atomic beams
- H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Patent holdings for IPC class H05H 1/46
Total number of patents in this class: 2916
10-year publication summary
|
171
|
193
|
188
|
260
|
224
|
175
|
141
|
177
|
218
|
165
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 12979 |
674 |
| Applied Materials, Inc. | 18932 |
198 |
| Lam Research Corporation | 5311 |
106 |
| Nissin Electric Co., Ltd. | 254 |
73 |
| ULVAC, Inc. | 1378 |
45 |
| Tohoku University | 2824 |
39 |
| Hitachi High-Tech Corporation | 5396 |
36 |
| Kokusai Electric Corporation | 2073 |
32 |
| Advanced Energy Industries, Inc. | 483 |
31 |
| Canon Anelva Corporation | 683 |
30 |
| MKS Instruments, Inc. | 644 |
29 |
| Kyosan Electric Mfg. Co., Ltd. | 174 |
28 |
| Hitachi Kokusai Electric Inc. | 871 |
26 |
| AES Global Holdings, Pte. Ltd. | 344 |
25 |
| Daihen Corporation | 475 |
22 |
| National University Corporation Nagoya University | 845 |
21 |
| Sharp Kabushiki Kaisha | 18693 |
20 |
| Plasmology4, Inc. | 47 |
18 |
| Shimadzu Corporation | 6193 |
16 |
| EMD Corporation | 27 |
16 |
| Other owners | 1431 |