- All sections
- C - Chemistrymetallurgy
- C23C - Coating metallic materialcoating material with metallic materialsurface treatment of metallic material by diffusion into the surface, by chemical conversion or substitutioncoating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
Patent holdings for IPC class C23C 16/00
Total number of patents in this class: 2462
10-year publication summary
|
93
|
93
|
57
|
54
|
42
|
50
|
45
|
14
|
13
|
10
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 13807 |
275 |
| Applied Materials, Inc. | 20375 |
239 |
| Lam Research Corporation | 5635 |
136 |
| Samsung Display Co., Ltd. | 38627 |
70 |
| Kokusai Electric Corporation | 2226 |
58 |
| ASM IP Holding B.V. | 2397 |
41 |
| Rtx Corporation | 10102 |
26 |
| Samsung Electronics Co., Ltd. | 157719 |
23 |
| Micron Technology, Inc. | 27657 |
23 |
| Canon Anelva Corporation | 684 |
20 |
| Versum Materials US, LLC | 678 |
20 |
| Hitachi High-Tech Corporation | 5846 |
20 |
| Novellus Systems, Inc. | 452 |
16 |
| Boe Technology Group Co., Ltd. | 44029 |
15 |
| Hon Hai Precision Industry Co., Ltd. | 4022 |
14 |
| Tsinghua University | 6211 |
14 |
| L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 4117 |
14 |
| Varian Semiconductor Equipment Associates, Inc. | 1187 |
13 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
13 |
| NGK Insulators, Ltd. | 5236 |
13 |
| Other owners | 1399 |