- All sections
- C - Chemistrymetallurgy
- C23C - Coating metallic materialcoating material with metallic materialsurface treatment of metallic material by diffusion into the surface, by chemical conversion or substitutioncoating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Patent holdings for IPC class C23C 16/448
Total number of patents in this class: 1414
10-year publication summary
80
|
90
|
97
|
107
|
116
|
101
|
124
|
154
|
134
|
62
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Tokyo Electron Limited | 12694 |
102 |
Applied Materials, Inc. | 18589 |
101 |
Lam Research Corporation | 5225 |
57 |
ASM IP Holding B.V. | 2071 |
56 |
Entegris, Inc. | 1867 |
50 |
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3976 |
36 |
Shin-Etsu Chemical Co., Ltd. | 5651 |
32 |
HORIBA STEC, Co., Ltd. | 334 |
29 |
Kokusai Electric Corporation | 2011 |
29 |
Versum Materials US, LLC | 641 |
23 |
Aixtron SE | 317 |
20 |
Fujikin Incorporated | 692 |
20 |
Samsung Electronics Co., Ltd. | 145864 |
19 |
Commissariat à l'énergie atomique et aux energies alternatives | 10923 |
19 |
King Fahd University of Petroleum and Minerals | 1179 |
17 |
Beneq Oy | 247 |
15 |
Flosfia Inc. | 232 |
15 |
Samsung Display Co., Ltd. | 34641 |
13 |
TMEIC Corporation | 774 |
11 |
Jiangsu Favored Nanotechnology Co., LTD | 161 |
10 |
Other owners | 740 |