- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/12 - Gaseous compositions
Patent holdings for IPC class C23F 1/12
Total number of patents in this class: 207
10-year publication summary
|
9
|
18
|
19
|
15
|
12
|
23
|
13
|
13
|
14
|
5
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 13796 |
23 |
| ASM IP Holding B.V. | 2387 |
22 |
| Applied Materials, Inc. | 20363 |
20 |
| Central Glass Company, Limited | 1291 |
12 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48248 |
7 |
| Lam Research Corporation | 5621 |
7 |
| Beijing NMC Co., Ltd. | 112 |
5 |
| The Regents of the University of Colorado, a body corporate | 2798 |
4 |
| Beijing E-town Semiconductor Technology, Co., Ltd | 302 |
4 |
| Resonac Corporation | 3516 |
4 |
| BASF SE | 21303 |
3 |
| Centre National de La Recherche Scientifique | 11016 |
3 |
| Showa Denko K.K. | 2072 |
3 |
| National Oilwell Varco, L.P. | 1698 |
3 |
| Versum Materials US, LLC | 677 |
3 |
| Tokyo Electron U.S. Holdings, Inc | 899 |
3 |
| Hitachi High-Tech Corporation | 5819 |
3 |
| Heraeus Electronics GmbH & Co. KG | 112 |
3 |
| Merck Patent GmbH | 5725 |
2 |
| Robert Bosch GmbH | 44128 |
2 |
| Other owners | 71 |