- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
Patent holdings for IPC class G01N 23/2251
Total number of patents in this class: 725
10-year publication summary
10
|
20
|
37
|
63
|
74
|
107
|
96
|
108
|
126
|
54
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hitachi High-Tech Corporation | 5323 |
95 |
ASML Netherlands B.V. | 7392 |
70 |
NuFlare Technology, Inc. | 845 |
35 |
KLA Corporation | 1555 |
31 |
Applied Materials Israel, Ltd. | 611 |
24 |
FEI Company | 944 |
21 |
Samsung Electronics Co., Ltd. | 146346 |
19 |
Applied Materials, Inc. | 18658 |
18 |
KLA-Tencor Corporation | 2544 |
17 |
Carl Zeiss SMT GmbH | 2979 |
14 |
Saudi Arabian Oil Company | 13185 |
10 |
TASMIT, Inc. | 65 |
9 |
Techinsights Inc. | 94 |
8 |
Carl Zeiss Microscopy GmbH | 1205 |
7 |
JFE Steel Corporation | 6852 |
6 |
National Institute for Materials Science | 1105 |
6 |
LG Chem, Ltd. | 17638 |
5 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 42804 |
5 |
Nikon Corporation | 7170 |
5 |
BP Corporation North America Inc. | 744 |
5 |
Other owners | 315 |