- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/00 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patent holdings for IPC class G03F 1/00
Total number of patents in this class: 1389
10-year publication summary
|
84
|
60
|
64
|
56
|
30
|
26
|
18
|
15
|
10
|
1
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7171 |
86 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40608 |
83 |
| Hoya Corporation | 2745 |
68 |
| Shin-Etsu Chemical Co., Ltd. | 5446 |
61 |
| Boe Technology Group Co., Ltd. | 38881 |
46 |
| Samsung Electronics Co., Ltd. | 139001 |
44 |
| Samsung Display Co., Ltd. | 32798 |
33 |
| Micron Technology, Inc. | 25824 |
32 |
| Kioxia Corporation | 10119 |
28 |
| Synopsys, Inc. | 2805 |
22 |
| Carl Zeiss SMS GmbH | 54 |
22 |
| Nikon Corporation | 7123 |
20 |
| Carl Zeiss SMT GmbH | 2815 |
20 |
| Texas Instruments Incorporated | 19432 |
19 |
| GLOBALFOUNDRIES U.S. Inc. | 6433 |
18 |
| LG Chem, Ltd. | 17639 |
17 |
| FUJIFILM Corporation | 28805 |
16 |
| Applied Materials, Inc. | 17745 |
15 |
| United Microelectronics Corp. | 4106 |
15 |
| Beijing BOE Optoelectronics Technology Co., Ltd. | 3829 |
15 |
| Other owners | 709 |