- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/00 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof
Patent holdings for IPC class G03F 1/00
Total number of patents in this class: 1229
10-year publication summary
|
60
|
64
|
56
|
30
|
26
|
21
|
16
|
10
|
9
|
4
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 8045 |
82 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 49324 |
79 |
| Shin-Etsu Chemical Co., Ltd. | 6157 |
53 |
| Hoya Corporation | 2400 |
51 |
| Boe Technology Group Co., Ltd. | 44746 |
47 |
| Samsung Electronics Co., Ltd. | 159473 |
37 |
| Samsung Display Co., Ltd. | 39229 |
31 |
| Micron Technology, Inc. | 27901 |
29 |
| Kioxia Corporation | 11025 |
25 |
| Carl Zeiss SMT GmbH | 3377 |
21 |
| Carl Zeiss SMS GmbH | 45 |
20 |
| Synopsys, Inc. | 2630 |
19 |
| LG Chem, Ltd. | 17986 |
16 |
| GLOBALFOUNDRIES U.S. Inc. | 6396 |
16 |
| Texas Instruments Incorporated | 19638 |
15 |
| Nikon Corporation | 7226 |
15 |
| United Microelectronics Corp. | 4534 |
15 |
| Beijing BOE Optoelectronics Technology Co., Ltd. | 3939 |
15 |
| FUJIFILM Corporation | 30808 |
14 |
| Applied Materials, Inc. | 20625 |
13 |
| Other owners | 616 |