- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/36 - Masks having proximity correction featuresPreparation thereof, e.g. optical proximity correction [OPC] design processes
Patent holdings for IPC class G03F 1/36
Total number of patents in this class: 1007
10-year publication summary
|
72
|
78
|
86
|
109
|
105
|
109
|
94
|
99
|
86
|
9
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40717 |
223 |
| ASML Netherlands B.V. | 7190 |
144 |
| Samsung Electronics Co., Ltd. | 139551 |
110 |
| D2s, Inc. | 156 |
47 |
| Synopsys, Inc. | 2805 |
44 |
| United Microelectronics Corp. | 4121 |
37 |
| Siemens Industry Software Inc. | 1646 |
23 |
| International Business Machines Corporation | 60224 |
22 |
| Intel Corporation | 46179 |
20 |
| Changxin Memory Technologies, Inc. | 4926 |
15 |
| Csmc Technologies Fab2 Co., Ltd. | 697 |
13 |
| GLOBALFOUNDRIES U.S. Inc. | 6437 |
12 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1774 |
12 |
| Kioxia Corporation | 10136 |
12 |
| Canon Inc. | 38296 |
8 |
| Dai Nippon Printing Co., Ltd. | 3985 |
8 |
| KLA-Tencor Corporation | 2550 |
8 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1033 |
8 |
| Micron Technology, Inc. | 25874 |
7 |
| Lam Research Corporation | 5022 |
7 |
| Other owners | 227 |