- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/36 - Masks having proximity correction featuresPreparation thereof, e.g. optical proximity correction [OPC] design processes
Patent holdings for IPC class G03F 1/36
Total number of patents in this class: 1081
10-year publication summary
|
78
|
85
|
109
|
105
|
109
|
94
|
102
|
89
|
68
|
20
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47015 |
233 |
| ASML Netherlands B.V. | 7701 |
163 |
| Samsung Electronics Co., Ltd. | 152914 |
127 |
| D2s, Inc. | 188 |
54 |
| Synopsys, Inc. | 2728 |
47 |
| United Microelectronics Corp. | 4429 |
38 |
| Siemens Industry Software Inc. | 1681 |
24 |
| International Business Machines Corporation | 62123 |
23 |
| Intel Corporation | 46665 |
23 |
| Changxin Memory Technologies, Inc. | 4923 |
15 |
| Csmc Technologies Fab2 Co., Ltd. | 737 |
13 |
| Kioxia Corporation | 10701 |
13 |
| GLOBALFOUNDRIES U.S. Inc. | 6399 |
12 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1739 |
12 |
| Canon Inc. | 42088 |
8 |
| Lam Research Corporation | 5494 |
8 |
| Dai Nippon Printing Co., Ltd. | 4194 |
8 |
| KLA-Tencor Corporation | 2524 |
8 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1033 |
8 |
| Fujian Jinhua Integrated Circuit Co., Ltd. | 449 |
8 |
| Other owners | 236 |