- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/72 - Repair or correction of mask defects
Patent holdings for IPC class G03F 1/72
Total number of patents in this class: 266
10-year publication summary
|
28
|
26
|
17
|
17
|
21
|
16
|
14
|
17
|
22
|
12
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 3339 |
52 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48438 |
45 |
| Carl Zeiss SMS Ltd. | 56 |
24 |
| Samsung Electronics Co., Ltd. | 157946 |
18 |
| ASML Netherlands B.V. | 7939 |
11 |
| Kioxia Corporation | 10823 |
11 |
| Intel Corporation | 47122 |
6 |
| Dai Nippon Printing Co., Ltd. | 4245 |
6 |
| KLA Corporation | 1856 |
6 |
| Applied Materials, Inc. | 20406 |
5 |
| Hoya Corporation | 2717 |
4 |
| D2s, Inc. | 199 |
4 |
| Agc, Inc. | 5537 |
4 |
| Changxin Memory Technologies, Inc. | 4933 |
4 |
| United Microelectronics Corp. | 4496 |
3 |
| Photronics, Inc. | 44 |
3 |
| Semes Co., Ltd. | 1678 |
3 |
| Toppan Printing Co., Ltd. | 2087 |
3 |
| Siemens Industry Software Inc. | 1855 |
3 |
| Synopsys, Inc. | 2714 |
2 |
| Other owners | 49 |