- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/74 - Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
Patent holdings for IPC class G03F 1/74
Total number of patents in this class: 104
10-year publication summary
|
6
|
5
|
7
|
8
|
7
|
2
|
18
|
19
|
14
|
4
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 2973 |
38 |
| Hoya Corporation | 2745 |
14 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42549 |
11 |
| Samsung Electronics Co., Ltd. | 145630 |
7 |
| Hitachi High-Tech Science Corporation | 291 |
3 |
| Varian Semiconductor Equipment Associates, Inc. | 1231 |
3 |
| Carl Zeiss SMS Ltd. | 47 |
3 |
| D2s, Inc. | 176 |
3 |
| Toppan Photomask Co., Ltd. | 42 |
3 |
| Intel Corporation | 46960 |
2 |
| Applied Materials, Inc. | 18565 |
2 |
| V Technology Co., Ltd. | 385 |
2 |
| ASML Netherlands B.V. | 7371 |
1 |
| Bruker Nano, Inc. | 337 |
1 |
| Carl Zeiss SMS GmbH | 53 |
1 |
| IMS Nanofabrication GmbH | 59 |
1 |
| KLA-Tencor Corporation | 2544 |
1 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1033 |
1 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1770 |
1 |
| Carl Zeiss SMT Inc. | 9 |
1 |
| Other owners | 5 |